Block copolymers with stable radical and fluorinated groups by ATRP

MRS Communications

Volumn 5, Issue 3, 2015, Pages 441-446

  Liedel, Clemens ^a,b   Moehle, Austin ^a   Fuchs, Gregory D ^a   Ober, Christopher K ^a  

^a School of Operations Research and Industrial Engineering   (United States)

^b MAX PLANCK INSTITUTE OF COLLOIDS AND INTERFACES   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; ELECTRONIC EQUIPMENT; FREE RADICAL REACTIONS; PHASE SEPARATION; REDOX REACTIONS; THERMOELECTRIC EQUIPMENT;

ELECTRICAL CHARACTERIZATION; ELECTRONIC APPLICATION; ELECTRONIC DEVICE; FLUORINATED BLOCK COPOLYMERS; MICROSTRUCTURE FORMATION; ORGANIC ELECTRONIC DEVICES; SYNTHESIS AND CHARACTERIZATIONS; THERMAL-ANNEALING;

ATOM TRANSFER RADICAL POLYMERIZATION;

EID: 84948584929     PISSN: 21596859     EISSN: 21596867     Source Type: Journal    
DOI: 10.1557/mrc.2015.50     Document Type: Article

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