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Volumn 31, Issue 11, 2016, Pages 1565-1573

Rigorous substrate cleaning process for reproducible thin film hematite (α-Fe2O3) photoanodes

Author keywords

FTO; Iron oxide; Substrate cleaning; Thin films; Water splitting

Indexed keywords

CLEANING; CONDUCTIVE FILMS; DEPOSITION; DOPING (ADDITIVES); HEMATITE; IRON OXIDES; MICROSTRUCTURE; OXIDE FILMS; PHOTOELECTROCHEMICAL CELLS; PULSED LASER DEPOSITION; SUBSTRATES; TIN OXIDES; TITANIUM OXIDES;

EID: 84945218543     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/jmr.2015.300     Document Type: Article
Times cited : (29)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.