High sensitive, miniaturized plano-convex quartz crystal microbalance fabricated by reactive ion etching and melting photoresist

TRANSDUCERS 2003 - 12th International Conference on Solid-State Sensors, Actuators and Microsystems, Digest of Technical Papers

Volumn 1, Issue , 2003, Pages 508-511

  Li, Li ^a   Abe, T ^a,b   Esashi, M ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Chemical technology; Crystallization; Dry etching; Electrodes; Fabrication; Isolation technology; Resists; Rough surfaces; Surface roughness; Wet etching

Indexed keywords

ACTUATORS; CRYSTAL RESONATORS; CRYSTALLIZATION; DRY ETCHING; ELECTRODES; FABRICATION; MELTING; MICROSYSTEMS; PHOTORESISTS; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; SOLID-STATE SENSORS; SURFACE ROUGHNESS; TRANSDUCERS; WET ETCHING;

CHEMICAL TECHNOLOGIES; FUNDAMENTAL VIBRATIONS; ISOLATION TECHNOLOGY; MASS PRODUCTION; MELTING PHOTORESIST; RESISTS; RESONANT CHARACTERISTICS; ROUGH SURFACES;

REACTIVE ION ETCHING;

EID: 84944737235     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SENSOR.2003.1215365     Document Type: Conference Paper

References (8)

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