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Volumn 2, Issue , 2003, Pages 1655-1658
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SOI silicon on glass for optical MEMS
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Author keywords
Etching; Glass; Micromechanical devices; Optical device fabrication; Optical sensors; Packaging; Particle beam optics; Silicon on insulator technology; Wafer bonding; Wafer scale integration
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Indexed keywords
ACTUATORS;
ELECTRON BEAM LITHOGRAPHY;
ELECTRONICS PACKAGING;
ETCHING;
FABRICATION;
GLASS;
GLASS BONDING;
LITHOGRAPHY;
MICROSYSTEMS;
MOEMS;
OPTICAL SENSORS;
PACKAGING;
REACTIVE ION ETCHING;
SILICON;
SILICON WAFERS;
SOLID-STATE SENSORS;
TRANSDUCERS;
WAFER BONDING;
WSI CIRCUITS;
CAPACITIVE DEVICES;
DEEP REACTIVE ION ETCHING;
FABRICATION METHOD;
MICROMECHANICAL DEVICE;
OPTICAL DEVICE FABRICATION;
PARTICLE BEAM OPTICS;
SILICON ON INSULATOR WAFERS;
SINGLE-CRYSTALLINE;
SILICON ON INSULATOR TECHNOLOGY;
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EID: 84944718392
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/SENSOR.2003.1217100 Document Type: Conference Paper |
Times cited : (8)
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References (3)
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