Highly Anti-UV Properties of Silk Fiber with Uniform and Conformal Nanoscale TiO2 Coatings via Atomic Layer Deposition

ACS Applied Materials and Interfaces

Volumn 7, Issue 38, 2015, Pages 21326-21333

  Xiao, Xingfang ^a,b   Liu, Xin ^a   Chen, Fengxiang ^a,c   Fang, Dong ^a   Zhang, Chunhua ^a   Xia, Liangjun ^a   Xu, Weilin ^a,b  

^a WUHAN TEXTILE UNIVERSITY   (China)

^b WUHAN INSTITUTE OF TECHNOLOGY   (China)

^c HUBEI UNIVERSITY   (China)

Author keywords

anti UV properties; atomic layer deposition; nanoscale coatings; silk fiber; titania

Indexed keywords

ATOMS; COATINGS; ENERGY DISPERSIVE SPECTROSCOPY; MECHANICAL PROPERTIES; NANOTECHNOLOGY; RADIATION PROTECTION; SCANNING ELECTRON MICROSCOPY; SILK; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ANTI-UV; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; NANO-SCALE COATINGS; SILK FIBER; THERMAL AND MECHANICAL PROPERTIES; TITANIA; TITANIUM TETRAISOPROPOXIDE; X-RAY PHOTOELECTRONS;

ATOMIC LAYER DEPOSITION;

BIOMATERIAL; NANOPARTICLE; SILK; TITANIUM; TITANIUM DIOXIDE;

CHEMISTRY; MATERIALS TESTING; MECHANICAL STRESS; PROCEDURES; SPECTROMETRY; THERMOGRAVIMETRY; ULTRASTRUCTURE; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

COATED MATERIALS, BIOCOMPATIBLE; MATERIALS TESTING; NANOPARTICLES; PHOTOELECTRON SPECTROSCOPY; SILK; SPECTROMETRY, X-RAY EMISSION; STRESS, MECHANICAL; THERMOGRAVIMETRY; TITANIUM; ULTRAVIOLET RAYS;

EID: 84942911945     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/acsami.5b05868     Document Type: Article

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