Fine-tuning control on CNT diameter distribution, length and density using thermal CVD growth at atmospheric pressure: an in-depth analysis on the role of flow rate and flow duration of acetylene (C2H2) gas

Applied Nanoscience (Switzerland)

Volumn 5, Issue 1, 2015, Pages 19-28

  Tripathi, Nishant ^a   Mishra, Prabhash ^a   Harsh, Harsh ^a   Islam, S S ^a  

^a JAMIA MILLIA ISLAMIA CENTRAL UNIVERSITY   (India)

Author keywords

AFM; Carbon nanotubes; Chemical vapor deposition; FESEM; Raman spectroscopy

Indexed keywords

ACETYLENE; AMORPHOUS CARBON; ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; CARBON NANOTUBES; CATALYSTS; CHEMICAL VAPOR DEPOSITION; ETCHING; FIELD EMISSION MICROSCOPES; FLOW RATE; LIGHTING; PRESSURE CONTROL; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

DIAMETER DISTRIBUTIONS; FESEM; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; HOMOGENEOUS GROWTH; IN-DEPTH ANALYSIS; OPTIMIZATION CONTROL; THERMAL CHEMICAL VAPOR DEPOSITION; VARIABLE PARAMETERS;

ATMOSPHERIC MOVEMENTS;

EID: 84940193127     PISSN: 21905509     EISSN: 21905517     Source Type: Journal    
DOI: 10.1007/s13204-013-0288-8     Document Type: Article

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