Preparation of Nickel-Aluminum-Containing Layered Double Hydroxide Films by Secondary (Seeded) Growth Method and Their Electrochemical Properties

Langmuir

Volumn 31, Issue 24, 2015, Pages 6704-6712

  Zhang, Fazhi ^a   Guo, Li ^a   Xu, Sailong ^a   Zhang, Rong ^a  

^a BEIJING UNIVERSITY OF CHEMICAL TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ELECTRIC DISCHARGES; ELECTROCHEMICAL ELECTRODES; ELECTRODES; FILM GROWTH; MICROSTRUCTURE; NICKEL; SUBSTRATES; SUSPENSIONS (FLUIDS);

APPLICATION PERFORMANCE; COLLOIDAL SUSPENSIONS; ELECTROCHEMICAL PERFORMANCE; HYDROTHERMAL CONDITIONS; HYDROTHERMAL TREATMENTS; LAYERED DOUBLE HYDROXIDES; POSITIVE ELECTRODE MATERIALS; PREPARATION PROCEDURES;

FILM PREPARATION;

ALUMINUM; HYDROXIDE; NICKEL;

CHEMISTRY; ELECTROCHEMICAL ANALYSIS; PARTICLE SIZE; SURFACE PROPERTY; SYNTHESIS;

ALUMINUM; ELECTROCHEMICAL TECHNIQUES; HYDROXIDES; NICKEL; PARTICLE SIZE; SURFACE PROPERTIES;

EID: 84934901709     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/acs.langmuir.5b00619     Document Type: Article

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