Surface etching of CZTS absorber layer by Br-related solution

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 12, Issue 6, 2015, Pages 741-744

  Miyazaki, H ^a   Aono, M ^a   Kishimura, H ^a   Katagiri, H ^b  

^a NATIONAL DEFENSE ACADEMY   (Japan)

^b NAGAOKA NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

Bromine solution; CZTS; Etching; Surface treatment

Indexed keywords

ACTIVATION ENERGY; BROMINE; CHEMICAL ACTIVATION; COPPER; ETCHING; INTERFACES (MATERIALS); SOLAR ABSORBERS; SOLAR CELLS; TEMPERATURE DISTRIBUTION; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CZTS; DIFFUSION-LIMITED PROCESS; ETCHING MECHANISM; HETERO INTERFACES; STRUCTURAL CHARACTERISTICS; SURFACE CONDITIONS; TEMPERATURE DEPENDENCE; THIN FILM SOLAR CELLS;

SURFACE TREATMENT;

EID: 84931563785     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.201400274     Document Type: Article

References (17)

1. H. Katagiri, K. Jimbo, W. S. Maw, K. Oishi, M. Yamazaki, H. Araki, and A. Takeuchi, Thin Solid Films 517, 2455 (2009).
2. K. Ito and T. Nakazawa, Jpn. J. Appl. Phys. 27, 2094 (1988).
3. T. Fukano, S. Tajima, and T. Ito, Appl. Phys. Express 6, 062301 (2013).
4. I. Repins, C. Beall, N. Vora, C. DeHart, D. Kuciauskas, P. Dippo, B. To, J. Mann, W.-C. Hsu, A. Goodrich, and R. Noufi, Sol. Energy Mater. Sol. Cells 101, 154 (2012).
5. M. T. Winkler, W. Wang, O. Gunawan, H. J. Hovel, K. Todorov, and D. B. Mitzi, Energy Environ. Sci. 7, 1029 (2014).
6. M. A. Green, K. Emery, Y. Hishikawa, W. Warta, and E. D. Dunlop, Prog. Photovolt.: Res. Appl. 22, 701 (2014).
7. W. Shockley and H. J. Queisser, J. Appl. Phys. 32, 510 (1960).
8. L. Kronik, U. Rau, J. F. Guillemoles, D. Braunger, H. W. Schock, and D. Cahen, Thin Solid Films 361-362, 353 (2000).
9. K. Timmo, M. Altosaar, J. Raudoja, M. Grossberg, M. Danilson, O. Volobujeva, and E. Mellikov, Proc. 35th IEEE Photovolt. Specialists Conf., 1982 (2010).
10. K. D. Lee, S.-W. Seo, D. -K. Lee, H. Kim, J. Jepng, M. J. Ko, B. Kim, D. H. Kim, and J. Y. Kim, Thin Solid Films 546, 294 (2013).
11. M. K. Kuusik, M. Altosaar, K. Muska, M. Pilvet, J. Raudoja, K. Timmo, T. Varema, M. Grossberg, E. Mellikov, and O. Volobujeva, Thin Solid Films 535, 18 (2013).
12. A. Fairbrother, E. Graecia-Hemme, V. Izquierdo-Roza, Z. Frontane, F. A. Pulgarin-Agudelo, O. Vigil-Galan, A. Perez-Rodrigues, and E Saucedo, J. Am. Chem. Soc. 134, 8018 (2012).
13. H. Katagiri, K. Jimbo, S. Yamada, T. Kamimura, W. S. Maw, T. Fukano, T. Ito, and T. Motohiro, Appl. Phys. Express 1, 041201 (2008).
14. H. Miyazaki, M. Aono, H. Kishimura, and H. Katagiri, Technical Digest of Photovolt. Sci. Eng. Conf., 1281 (2013).
15. M. Bouttemy, P. Tran-Van, I. Gerard, T. Hildebrandt, A. Causier, J. L. Pelouard, G. Dagher, Z. Jehl, N. Naghavi, G. Voorwinden, B. Dimmler, M. Powalla, J. F. Guillemoles, D. Lincot, and A. Etcheberry, Thin Solid Films 519, 7207 (2011).
16. D. Zhuang and J. H. Edgar, Mater. Sci. Eng. R 48, 1 (2005).
17. P. A. Fernandes, P. M. P. Salome, and A. F. Da Cunha, J. Alloys Compd. 509, 7600 (2011).