Hollow organosilica nanospheres prepared through surface hydrophobic layer protected selective etching

Applied Surface Science

Volumn 340, Issue , 2015, Pages 126-131

  Li, J ^a   Chen, L X ^a   Li, X ^a   Zhang, C C ^a   Zeng, F L ^a  

^a WUHAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Hollow organosilica nanospheres; Hydrophobic layer protection; One step method; Selective etching

Indexed keywords

ETCHING; NANOSPHERES; SHELLS (STRUCTURES); SILICA;

3-THIOCYANATOPROPYLTRIETHOXYSILANE; CETYLTRIMETHYLAMMONIUM BROMIDE; HOLLOW SILICA NANOSPHERES; HYDROPHOBIC LAYERS; MORPHOLOGY AND STRUCTURES; ONE-STEP METHODS; ORGANOSILICAS; SELECTIVE ETCHING;

HYDROPHOBICITY;

EID: 84926213757     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2015.02.168     Document Type: Article

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