Effects of pH on the hierarchical structures and photocatalytic performance of Cu-doped BiVO4 prepared via the hydrothermal method

Materials Science in Semiconductor Processing

Volumn 35, Issue , 2015, Pages 197-206

  Gao, Xiaoming ^a   Wang, Zihang ^a   Fu, Feng ^a   Li, Wenhong ^b  

^a YAN'AN UNIVERSITY   (China)

^b NORTHWEST UNIVERSITY   (China)

Author keywords

Cu doped BiVO4; Hierarchical structure; Hydrothermal preparation; pH value; Photocatalytic degradation kinetics

Indexed keywords

COPPER; DEGRADATION; FREE RADICAL REACTIONS; IRRADIATION; LIGHT; MORPHOLOGY; OXYGEN; PH; PHENOLS; PHOTOCATALYSIS; REACTION KINETICS;

CU-DOPED; HIERARCHICAL STRUCTURES; HYDROTHERMAL PREPARATION; PH VALUE; PHOTO CATALYTIC DEGRADATION;

PHOTODEGRADATION;

EID: 84925866935     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2015.03.012     Document Type: Article

References (45)

1. H.X. Li, Z.F. Bian, J. Zhu, Y.N. Huo, H. Li, and Y.F. Lu J. Am. Chem. Soc. 129 2007 4538 4539
2. B. Liu, H.M. Chen, C. Liu, S.C. Andrews, C. Hahn, and P. Yang J. Am. Chem. Soc. 135 2013 9995 9998
3. J.C. Huo, Y.J. Hu, H. Jiang, X.Y. Hou, and C.Z. Li Chem. Eng. J. 258 2014 163 170
4. S.K. Kim, S. Han, W. Jeon, J.H. Yoon, J.H. Han, W. Lee, and C.S. Hwang ACS Appl. Mater. Interfaces 4 2012 4726 4730
5. W.Y. Zhang, S.J. Wang, J.G. Li, and X.Y. Yang Catal. Commun. 59 2015 189 194
6. W.J. Ong, L.L. Tan, S.P. Chai, S.T. Yong, and A.R. Mohamed ChemSusChem 7 2014 690 719
7. A. Mukherji, S. Brian, G.Q. Lu, and L. Z Wang ACS Nano 5 2011 3483 3492
8. S. Balaz, S.H. Porter, P.M. Woodward, and L.J. Brillson Chem. Mater. 25 2013 3337 3343
9. D. Wang, T. Hisatomi, T. Takata, C. Pan, M. Katayama, J. Kubota, and K. Domen Angew. Chem. 125 2013 11462 11466
10. T.A. Vu, C.D. Dao, T.T.T. Hoang, P.T. Dang, H.T.K. Tran, K.T. Nguyen, G.H. Le, T.V. Nguyen, and G.D. Lee Mater. Lett. 123 2014 176 180
11. G.T. Pan, M.H. Lai, R.C. Juang, T.W. Chung, and T.C.K. Yang Ind. Eng. Chem. Res. 50 2011 2807 2814
12. Y.R. Jiang, H.P. Lin, W.H. Chung, Y.M. Dai, W.Y. Lin, and C.C. Chen J. Hazard. Mater. 283 2015 787 805
13. H.L. Chen, W.W. Lee, W.H. Chung, H.P. Lin, Y.J. Chen, Y.R. Jiang, W.Y. Lin, and C.C. Chen J. Taiwan Inst. Chem. Eng. 45 2014 1892 1909
14. M. Wang, H.Y. Zheng, J. Liu, D. Dong, Y.S. Che, and C.X. Yang Mater. Sci. Semicond. Process. 30 2015 307 313
15. K.L. Li, W.W. Lee, C.S. Lu, Y.M. Dai, S.Y. Chou, H.L. Chen, H.P. Lin, and C.C. Chen J. Taiwan Inst. Chem. Eng. 45 2014 2688 2697
16. X.H. Gao, H.B. Wu, L.X. Zheng, Y.J. Zhong, Y. Hu, and X.W. Lou Angew. Chem. Int. Ed. 53 2014 5917 5921
17. S. Usai, S. Obregón, A.I. Becerro, and G. Colón J. Phys. Chem. C 117 2013 24479 24484
18. X.D. Fu, M.Z. Xie, P. Luan, and L.Q. Jing ACS Appl. Mater. Interfaces 6 2014 18550 18557
19. R. Strobel, H.J. Metz, and S.E. Pratsinis Chem. Mater. 20 2008 6346 6351
20. R.B. Jiang, B.X. Li, C.H. Fang, and J.F. Wang Adv. Mater. 26 2014 5274 5309
21. J. Fenoll, I. Garrido, P. Hellín, P. Flores, N. Vela, and S. Navarro J. Photochem. Photobiol. A 298 2015 24 32
22. W.W. He, H.M. Jia, W.G. Wamer, Z. Zheng, P.J. Li, J.H. Callahan, and J.J. Yin J. Catal. 320 2014 97 105
23. L.S. Zhang, K.H. Wong, H.Y. Yip, C. Hu, J.C. Yu, C.Y. Chan, and P. K Wong Environ. Sci. Technol. 44 2010 1392 1398
24. T. Kamegawa, S. Matsuura, H. Seto, and H Yamashita Angew. Chem. 125 2013 950 953
25. M. McEntee, W.J. Tang, M. Neurock, and J.T. Yates Jr J. Am. Chem. Soc. 136 2014 5116 5120
26. R. Su, R. Tiruvalam, Q. He, N. Dimitratos, L. Kesavan, C. Hammond, J.A.L. Sanchez, R. Bechstein, C.J. Kiely, G.J. Hutchings, and F. Besenbacher ACS Nano 6 2012 6284 6292
27. G.Q. Tan, L.L. Zhang, H.J. Ren, S.S. Wei, J. Huang, and A. Xia ACS Appl. Mater. Interfaces 5 2013 5186 5193
28. X. Meng, L. Zhang, H.X. Dai, Z.X. Zhao, R.Z. Zhang, and Y.X. Liu Mater. Chem. Phys. 125 2011 59 65
29. A.P. Zhang, J.Z. Zhang, N.Y. Cui, X.Y. Tie, Y.W. An, and L.J. Li J. Mol. Catal. A: Chem. 304 2009 28 32
30. S. Obregón, A. Caballero, and G. Colón. Appl. Catal. B: Environ. 117-118 2012 59 66
31. P.M. Rao, L.L. Cai, C. Liu, I.S. Cho, C.H. Lee, J. M Weisse, P.D. Yang, and X.L. Zheng Nano Lett. 14 2014 1099 1105
32. S.I. Naya, M. Tanaka, K. Kimura, H. Tada, Langmuir. 27, 2011, pp. 10334-10339.
33. S. Tokunag, H. Kato, and A. Kudo Chem. Mater. 13 2001 4624 4628
34. M. CLong, W.M. Cai, and H. Kisch J. Phys. Chem. C 112 2008 48 554
35. L.X. Pang, X.Y. Wang, and X. D Tang Solid State Sci. 39 2015 29 33
36. J. Yu, and A Kudo Adv. Funct. Mater. 16 2006 2163 2169
37. S.I. Naya, T. Niwa, R. Negishi, H. Kobayashi, and H. Tada Angew. Chem. Int. Ed. 53 2014 13894 13897
38. Z. Yu, B.S. Yin, F.Y. Qu, and X Wu Chem. Eng. J. 258 2014 203 209
39. M.C Yin, Z.S. Li, J.H. Kou, and Z.G. Zou Environ. Sci. Technol. 43 2009 8361 8366
40. Y.X. Chen, S.Y. Yang, K. Wang, and L.P. Lou J. Photochem. Photobiol. A 172 2005 47 54
41. N. Zhang, S.Q. Liu, X.Z. Fu, and Y.J. Xu J. Phys. Chem. C 115 2011 9136 9145
42. V.A. Sakkas, I.M. Arabatzis, I.K. Konstantinou, A.D. Dimou, T.A. Albanis, and P. Falaras Appl. Catal. B: Envion. 49 2004 195 205
43. A.I. Kontos, I.M. Arabatzis, D.S. Tsoukleris, A.G. Kontos, M.C. Bernard, D.E. Petrakis, and P Falaras Catal. Today 101 2005 275 281
44. J.B. Zhong, J.L. Wang, L. Tao, M.C. Gong, Z.M. Liu, and Y.Q. Chen J. Hazard. Mater. 139 2007 323 331
45. M. Lewandowski, and D.F. Ollis Appl. Catal. B: Environ. 43 2003 309 327