Time and spatial resolved optical and electrical characteristics of continuous and time modulated RF plasmas in contact with conductive and dielectric substrates

European Physical Journal D

Volumn 68, Issue 3, 2014, Pages

  Hofmann, Sven ^a   Van Gils, Koen ^a   Van Der Linden, Steven ^a   Iseni, Sylvain ^a,b   Bruggeman, Peter ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b LEIBNIZ INSTITUTE FOR PLASMA SCIENCE AND TECHNOLOGY   (Germany)

Author keywords

Plasma Physics

Indexed keywords

ATMOSPHERIC PRESSURE; ELECTRIC FIELDS; ELECTRODES; FIGHTER AIRCRAFT; OPTICAL SIGNAL PROCESSING; PLASMA JETS; PLASMA SOURCES; SUBSTRATES;

ATMOSPHERIC PRESSURE PLASMA JETS; CONDUCTIVE SUBSTRATES; DIELECTRIC SUBSTRATES; DIRECT CONTACT; DISSIPATED POWER; ELECTRICAL CHARACTERISTIC; GAS TEMPERATURE; OPTICAL CHARACTERISTICS; PLASMA PHYSICS; RF PLASMA;

GAS TEMPERATURE;

EID: 84924902377     PISSN: 14346060     EISSN: 14346079     Source Type: Journal    
DOI: 10.1140/epjd/e2014-40430-3     Document Type: Article

References (50)

1. L. Bárdos, H. Baránková, Thin Solid Films 518, 6705 (2010)
2. J. Heinlin, G. Morfill, M. Landthaler, W. Stolz, G. Isbary, J.L. Zimmermann, T. Shimizu, S. Karrer, J. Dtsch. Dermatol. Ges. 8, 968 (2010)
3. M. Laroussi, IEEE Trans. Plasma Sci. 37, 714 (2009)
4. S. Kalghatgi et al., in Plasma Assisted Decontamination of Biological and Chemical Agents, edited by A. Fridman, S. Gçüeri (Springer Science-Business Media B.V., 2008), pp. 173-181
5. G.B. McCombs, M.L. Darby, Int. J. Dent. Hygiene 8, 10 (2010)
6. G. Lloyd, G. Friedman, S. Jafri, G. Schultz, A. Fridman, K. Harding, Plasma Process. Polym. 7, 194 (2010)
7. H.W. Lee, G.Y. Park, Y.S. Seo, Y.H. Im, S.B. Shim, H.J. Lee, J. Phys. D 44, 053001 (2011)
8. M.G. Kong, G. Kroesen, G. Morfill, T. Nosenko, T. Shimizu, J. Van Dijk, J.L. Zimmermann, New J. Phys. 11, 115012 (2009)
9. G. Morfill, M. Kong, J. Zimmermann, New J. Phys. 11, 115011 (2009)
10. M. Laroussi, IEEE Trans. Plasma Sci. 24, 1188 (1996)
11. K. Kelly-Wintenberg, T.C. Montie, C. Brickman, J.R. Roth, A.K. Carr, K. Sorge, L.C. Wadsworth, P.P. Tsai, J. Ind. Microbiol. Biotechnol. 20, 69 (1998)
12. A. Schütze, J.Y. Jeong, S.E. Babayan, J. Park, G.S. Selwyn, R.F. Hicks, IEEE Trans. Plasma Sci. 26, 1685 (1998)
13. X. Lu, M. Laroussi, V. Puech, Plasma Sources Sci. Technol. 21, 34005 (2012)
14. G.Y. Park, S.J. Park, M.Y. Choi, I.G. Koo, J.H. Byun, J.W. Hong, J.Y. Sim, G.J. Collins, J.K. Lee, Plasma Sources Sci. Technol. 21, 043001 (2012)
15. H.E. Wagner, R. Brandenburg, K.V. Kozlov, A. Sonnenfeld, P. Michel, J.F. Behnke, Vacuum 71, 417 (2003)
16. G.E. Morfill, T. Shimizu, B. Steffes, H.U. Schmidt, New J. Phys. 11, 115019 (2009)
17. M. Kuchenbecker, N. Bibinov, A. Kaemlimg, D. Wandke, P. Awakowicz, W. Viöl, J. Phys. D 42, 045212 (2009)
18. D. Dobrynin, G. Fridman, G. Friedman, A. Fridman, New J. Phys. 11, 115020 (2009)
19. N.Y. Babaeva, M.J. Kushner, J. Phys. D 43, 185206 (2010)
20. G. Fridman, A.D. Brooks, M. Balasubramanian, A. Fridman, A. Gutsol, V.N. Vasilets, H. Ayan, G. Friedman, Plasma Process. Polym. 4, 370 (2007)
21. E.P. van der Laan, E. Stoffels, M. Steinbuch, Plasma Sources Sci. Technol. 15, 582 (2006)
22. Y. Sakiyama, D.B. Graves, E. Stoffels, J. Phys. D 41, 95204 (2008)
23. Y. Kim, M.S. Cha, W.H. Shin, Y.H. Song, J. Korean Phys. Soc. 43, 732 (2003)
24. S. Bornholdt, M. Wolter, H. Kersten, Eur. Phys. J. D 60, 653 (2010)
25. E. Stoffels, I.E. Kieft, R.E.J. Sladek, L.J.M. van den Bedem, E.P. van der Laan, M. Steinbuch, Plasma Sources Sci. Technol. 15, S169 (2006)
26. M. Dünnbier, A. Schmidt-Bleker, J. Winter, M. Wolfram, R. Hippler, K.D. Weltmann, S. Reuter, J. Phys. D 46, 435203 (2013)
27. D. Maletić, N. Puač, S. Lazović, G. Malović, T. Gans, V. Schulz-von der Gathen, Z.L. Petrović, Plasma Phys. Control. Fusion 54, 124046 (2012)
28. U. Kaatze, J. Chem. Eng. Data 34, 371 (1989)
29. Conductivity and Resistivity Values for Aluminum & Alloys, http://www.ndt-ed.org/
30. http://www.ohara-inc.co.jp/en/product/electronics/gd-fht.html
31. http://www.ultiquestcom.com/products/optics/optical-glass-nbk7-b270-and-others.html
32. S. Hofmann, A.F.H. van Gessel, T. Verreycken, P. Bruggeman, Plasma Sources Sci. Technol. 20, 065010 (2011)
33. J. Walsh, M. Kong, Appl. Phys. Lett. 93, 111501 (2008)
34. V. Léveillé, S. Coulombe, Meas. Sci. Technol. 17, 3027 (2006)
35. P. Bruggeman, F. Iza, P. Guns, D. Lauwers, M.G. Kong, Y.A. Aranda-Gonzalvo, C. Leys, D.C. Schram, Plasma Sources Sci. Technol. 19, 15016 (2010)
36. S. Hofmann, P. Bruggeman, IEEE Trans. Plasma Sci. 39, 2 (2011)
37. E. Castaños Martínez, M. Moisan, Y. Kabouzi, J. Phys. D 42, 012003 (2009)
38. J. Schäfer, R. Foest, A. Ohl, K.D. Weltmann, Plasma Phys. Control. Fusion 51, 124045 (2009)
39. S. Hofmann, A. Sobota, P. Bruggeman, IEEE Trans. Plasma Sci. 40, 2888 (2012)
40. D.B. Kim, S.Y. Moon, H. Jung, B. Gweon, W. Choe, Phys. Plasmas 17, 053508 (2010)
41. N. Balcon, A. Aanesland, R. Boswell, Plasma Sources Sci. Technol. 16, 217 (2007)
42. R. Ye, T. Ishigaki, T. Sakuta, Plasma Sources Sci. Technol. 14, 387 (2005)
43. C.A.J. van Gils, S. Hofmann, B.K.H.L. Boekema, R. Brandenburg, P.J. Bruggeman, J. Phys. D 46, 175203 (2013)
44. A.F.H. van Gessel, Ph.D. thesis, Eindhoven University of Technology, 2013
45. A.F.H. van Gessel, K.M.J. Alards, P.J. Bruggeman, J. Phys. D 46, 265202 (2013)
46. A. Sobota, J. Van Dijk, M. Haverlag, J. Phys. D 44, 224003 (2011)
47. S. Zhang, W. van Gaens, A.F.H. van Gessel, S. Hofmann, E. van Veldhuizen, A. Bogaerts, P. Bruggeman, J. Phys. D 46, 205202 (2013)
48. G.C.Y. Chan, J.T. Shelley, J.S. Wiley, C. Engelhard, A.U. Jackson, R.G. Cooks, G.M. Hieftje, Anal. Chem. 83, 3675 (2011)
49. O. Motret, C. Hibert, S. Pellerin, J.M. Pouvesle, J. Phys. D 33, 1493 (2000)
50. P. Bruggeman, D.C. Schram, M.G. Kong, C. Leys, Plasma Process. Polym. 6, 751 (2009)