SCOPUS 정보 검색 플랫폼

Volumn 26, Issue 35, 2014, Pages 6119-6124

Scalable nanopillar arrays with layer-by-layer patterned overt and covert images

(10) Lee, Kyoung G a Choi, Bong Gill a,c Kim, Byeong Il b Shyu, Terry a Oh, Myung Seok d Im, Sung Gap d Chang, Sung Jin e Lee, Tae Jae b Kotov, Nicholas A a Lee, Seok Jae b

a UNIVERSITY OF MICHIGAN (United States)

b National Nano Fab Center (NNFC) (South Korea)

c Kangwon National University (South Korea)

d Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

e Korea Basic Science Institute (KBSI) (South Korea)

Author keywords

layer by layer assembly; nanomaterials; nanopatterning; nanopillars; nanostructures; scalable nanotechnology; wettability

Indexed keywords

CURING; NANOSTRUCTURED MATERIALS; WETTING;

ANTI-COUNTERFEIT TECHNOLOGY; LAYER BY LAYER; LAYER-BY-LAYER ASSEMBLIES; NANO-PILLAR ARRAYS; NANOPATTERNING; NANOPILLARS; REPLICATION PROCESS; UV CURABLE POLYMER;

NANOSTRUCTURES;

BAYSILON; DIMETICONE; NANOMATERIAL; POLYURETHAN; SILICON;

CHEMISTRY; OXIDATION REDUCTION REACTION; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY;

DIMETHYLPOLYSILOXANES; MICROSCOPY, ELECTRON, SCANNING; NANOSTRUCTURES; OXIDATION-REDUCTION; POLYURETHANES; SILICON; SURFACE PROPERTIES;

EID: 84924240941 PISSN: 09359648 EISSN: 15214095 Source Type: Journal
DOI: 10.1002/adma.201401246 Document Type: Article

Times cited : (41)

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