SILAR-deposited hematite films for photoelectrochemical water splitting: Effects of Sn, Ti, thickness, and nanostructuring

Journal of Physical Chemistry C

Volumn 119, Issue 9, 2015, Pages 4454-4465

  Abel, Anthony J ^a   Garcia Torregrosa, Ivan ^a,b   Patel, Anjli M ^a   Opasanont, Borirak ^a   Baxter, Jason B ^a  

^a Drexel University   (United States)

^b UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EFFICIENCY; HEMATITE; HOLE MOBILITY; PHOTOELECTROCHEMICAL CELLS; SCAFFOLDS; SEPARATION; TIN; TITANIUM DIOXIDE;

ANNEALING TREATMENTS; DOPANT CONCENTRATIONS; INTERFACIAL HOLE TRANSFER; INVERSE OPAL SCAFFOLDS; PHOTOELECTROCHEMICAL WATER SPLITTING; PHOTOELECTROCHEMICALS; SEPARATION EFFICIENCY; SUCCESSIVE IONIC LAYER ADSORPTION AND REACTIONS;

FLUORINE COMPOUNDS;

EID: 84924103302     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp510027u     Document Type: Article

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