Simple cleaning and conditioning of silicon surfaces with UV/ozone Sources

Energy Procedia

Volumn 55, Issue , 2014, Pages 834-844

  Moldovan, Anamaria ^a   Feldmann, Frank ^a   Krugel, Georg ^a   Zimmer, Martin ^a   Rentsch, Jochen ^a   Hermle, Martin ^a   Roth Fölsch, Angelika ^b   Kaufmann, Kai ^c   Hagendorf, Christian ^c  

^a FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

^b WC Heraeus GmbH   (Germany)

^c FRAUNHOFER CENTER FOR SILICON PHOTOVOLTAICS CSP   (Germany)

Author keywords

Pre passivation conditioning; Surface cleaning; Tunnel oxide; Uv ozone

Indexed keywords

EID: 84922336801     PISSN: 18766102     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1016/j.egypro.2014.08.067     Document Type: Conference Paper

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