Fabrication characteristics of silicon nanowires via the electrochemical electroless etching method

Journal of Nanoscience and Nanotechnology

Volumn 15, Issue 7, 2015, Pages 5291-5294

  Kang, ByeongSu ^a   Jeong, Chae Hwan ^a   Kim, Changheon ^a   Kim, Min Young ^a   Choi, Bum Ho ^a   Lee, Moo Sung ^b   Kim, Ho Sung ^a  

^a Korea Institute of Industrial Technology   (South Korea)

^b Chonnam National University   (South Korea)

Author keywords

Electrical etching; Electroless coating; Nanowire structure; Silicon; Solar cell

Indexed keywords

ELECTROLESS PLATING; NANOWIRES; SILICON; SOLAR CELLS;

ABSORPTION LAYER; ELECTROLESS COATING; ELECTROLESS ETCHINGS; NANOWIRE STRUCTURES; SILICON NANOWIRES;

ELECTROCHEMICAL ETCHING;

EID: 84920651560     PISSN: 15334880     EISSN: 15334899     Source Type: Journal    
DOI: 10.1166/jnn.2015.10357     Document Type: Article

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