Dynamics of femtosecond laser-produced plasma ions

Applied Physics A: Materials Science and Processing

Volumn 117, Issue 1, 2014, Pages 111-115

  Ni, Xiaochang ^a,b,c   Anoop, K K ^b,c   Wang, X ^c   Paparo, D ^c   Amoruso, S ^b,c   Bruzzese, R ^b,c  

^a TIANJIN UNIVERSITY OF TECHNOLOGY AND EDUCATION   (China)

^b UNIVERSITY OF NAPLES FEDERICO II   (Italy)

^c CNR SPIN   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; ANGULAR DISTRIBUTION; KINETIC ENERGY; KINETICS; LASER ABLATION; LASER PRODUCED PLASMAS; PROBES; ULTRAFAST LASERS; ULTRASHORT PULSES;

ABLATION PLASMA; ABLATION THRESHOLDS; ANGULAR REGIONS; AVERAGE VELOCITY; FEMTOSECOND LASER-PRODUCED PLASMA; SILICON TARGETS; TARGET SURFACE; TIME OF FLIGHT;

IONS;

EID: 84920253171     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-014-8239-0     Document Type: Article

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