Understanding the selective etching of electrodeposited ZnO nanorods

Langmuir

Volumn 30, Issue 46, 2014, Pages 14079-14085

  Illy, Benoit N ^a   Ingham, Bridget ^b,c   Toney, Michael F ^d   Nandhakumar, Iris ^e   Ryan, Mary P ^a  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

^b CALLAGHAN INNOVATION   (New Zealand)

^c VICTORIA UNIVERSITY OF WELLINGTON   (New Zealand)

^d SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^e UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE COMPOUNDS; CONTROL RODS; ELECTRODEPOSITION; ETCHING; NANORODS; PH EFFECTS; THIN WALLED STRUCTURES; YARN; ZINC OXIDE;

CHLORIDE CONCENTRATIONS; CHLORIDE ION CONCENTRATION; DISSOLUTION MECHANISM; DISSOLUTION PROCESS; RATE OF DISSOLUTIONS; SELECTIVE DISSOLUTION; SELECTIVE ETCHING; ULTRA-THIN-WALLED TUBES;

DISSOLUTION;

EID: 84912552024     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la503765a     Document Type: Article

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