Optical and photoelectrochemical studies on Ag2O/TiO2 double-layer thin films

Thin Solid Films

Volumn 570, Issue PB, 2014, Pages 436-444

  Li, Chuan ^a,b   Hsieh, J H ^c   Cheng, J C ^d   Huang, C C ^a  

^a NATIONAL YANG MING UNIVERSITY   (Taiwan)

^b NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^c MING CHI UNIVERSITY OF TECHNOLOGY   (Taiwan)

^d NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Ag2O TiO2 thin film; DC magnetron reactive sputtering; Optical absorption; Photoelectrical current

Indexed keywords

ABSORPTION SPECTROSCOPY; COPPER OXIDES; ELECTROCHEMISTRY; ELECTRONS; ENERGY GAP; INFRARED DEVICES; LIGHT ABSORPTION; MAGNETRONS; MORPHOLOGY; OXIDE MINERALS; REACTIVE SPUTTERING; SCANNING ELECTRON MICROSCOPY; SILVER OXIDES; SUBSTRATES; TITANIUM DIOXIDE; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION;

DC MAGNETRON REACTIVE SPUTTERING; DOUBLE-LAYER FILMS; ELECTRON-HOLE RECOMBINATION; PHOTOELECTROCHEMICALS; PHOTOEXCITED ELECTRONS; PHOTOSPECTROMETER; TIO2 THIN FILMS; UV-VIS-NIR SPECTRA;

THIN FILMS;

EID: 84912014049     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2014.05.018     Document Type: Article

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