Fabrication and NO2 gas-sensing properties of reduced graphene oxide/WO3 nanocomposite films

Talanta

Volumn 132, Issue , 2015, Pages 398-405

  Su, Pi Guey ^a   Peng, Shih Liang ^a  

^a CHINESE CULTURE UNIVERSITY   (Taiwan)

Author keywords

Metal organic decomposition (MOD); Nanocomposite; Polyol; Reduced graphene oxide (RGO); Room temperature gas sensor; Tungsten oxide (WO3)

Indexed keywords

ALCOHOLS; ATOMIC FORCE MICROSCOPY; CHEMICAL DETECTION; CHEMICAL SENSORS; DECOMPOSITION; FABRICATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS DETECTORS; GAS SENSING ELECTRODES; GASES; GRAPHENE; MICROSTRUCTURE; NANOCOMPOSITES; NITROGEN OXIDES; ORGANOMETALLICS; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

METAL ORGANIC DECOMPOSITION; POLYOL; REDUCED GRAPHENE OXIDES (RGO); ROOM TEMPERATURE GAS SENSOR; TUNGSTEN OXIDE;

NANOCOMPOSITE FILMS;

AIR POLLUTANT; GRAPHITE; NANOCOMPOSITE; NITROGEN DIOXIDE; OXIDE; TUNGSTEN; TUNGSTEN OXIDE;

AIR POLLUTANT; ANALYSIS; CHEMICAL ANALYSIS; CHEMISTRY; DEVICES; INFRARED SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; TEMPERATURE;

AIR POLLUTANTS; CHEMISTRY TECHNIQUES, ANALYTICAL; GRAPHITE; MICROSCOPY, ELECTRON, SCANNING; NANOCOMPOSITES; NITROGEN DIOXIDE; OXIDES; SPECTROSCOPY, FOURIER TRANSFORM INFRARED; TEMPERATURE; TUNGSTEN;

EID: 84908199050     PISSN: 00399140     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.talanta.2014.09.034     Document Type: Article

References (39)

1. K.S. Novoselov, A.K. Geim, S.V. Morozov, D. Jiang, Y. Zhang, S.V. Dubonos, I.V. Grigorieva, and A.A. Firsov Science 306 2004 666 669
2. K.S. Novoselov, A.K. Geim, S.V. Morozov, D. Jiang, M.I. Katsnelson, I.V. Grigorieva, S.V. Dubonos, and A.A. Firsov Nature 438 2005 197 200
3. A.A. Balandin, S. Ghosh, W. Bao, I. Calizo, D. Teweldebrhan, F. Miao, and C.N. Lau Nano Lett. 8 2008 902 907
4. C. Daniela, V.D. Marcano, J.M. Kosynkin, J.M. Berlin, A. Sinitskii, Z. Sun, A. Slesarev, L.B. Alemany, W. Lu, and M.J.M. Tour Nano 4 2010 4806 4814
5. A. Lerf, H. He, M. Forster, and J. Kilnowski J. Phys. Chem. B 102 1998 4477 4482
6. S.F. Pei, and H.M. Cheng Carbon 50 2012 3210 3228
7. G. Lu, L.E. Ocola, and J. Chen Appl. Phys. Lett. 94 2009 083111-3
8. J.T. Robinson, F.K. Perkins, E.S. Snow, Z. Wei, and P.E. Sheehan Nano. Lett. 8 2008 3137 3140
9. V. Dua, S.P. Surwade, S. Ammu, S.R. Agnihotra, S. Jain, K.E. Roberts, S. Park, R.S. Ruoff, and S.K. Manohar Angew. Chem. Int. Ed. 49 2010 2154 2157
10. N. Hu, Y. Wang, J. Chai, R. Gao, Z. Yang, E.S.W. Kong, and Y. Zhang Sens. Actuators B 163 2012 107 114
11. Z. Yang, R. Gao, N. Hu, J. Chai, Y. Cheng, L. Zhang, H. Wei, E.S.W. Kong, and Y. Zhang Nano-Micro Lett. 4 2012 1 9
12. N. Hu, Z. Yang, Y. Wang, L. Zhang, Y. Wang, X. Huang, H. Wei, L. Wei, and Y. Zhang Nanotechnology 25 2014 025502
13. X. Huang, N. Hu, R. Gao, Y. Yu, Y. Wang, Z. Yang, E.S.W. Kong, H. Wei, and Y. Zhang J. Mater. Chem. 22 2012 22488 22495
14. A. Gutés, B. Hsia, A. Sussman, W. Mickelson, A. Zettl, C. Carraro, and R. Maboudian Nanoscale 4 2012 438 440
15. Q. Huang, D. Zeng, H. Li, and C. Xie Nanoscale 4 2012 5651 5668
16. P.A. Russo, N. Donato, S.G. Leonardi, S. Baek, D.E. Conte, G. Neri, and N. Pinna Angew. Chem. Int. Ed. 51 2012 11053 11057
17. J. Chen, J. Shi, X. Wang, H. Cui, and M. Fu Chin. J. Catal. 34 2013 621 640
18. S. Bai, and X.P. Shen RSC Adv. 2 2012 64 98
19. Y. Si, and E.T. Samulski Chem. Mater. 20 2008 6792 6797
20. J.W. Qin, M.H. Cao, N. Li, and C.W. Hu J. Mater. Chem. 21 2011 17167 17174
21. T.S. Wu, S. Liu, Y.L. Luo, W.B. Lu, L. Wang, and X.P. Sun Nanoscale 3 2011 2142 2144
22. X. An, J.C. Yu, Y. Wang, Y. Hu, X. Yu, and G. Zhang J. Mater. Chem. 22 2012 8525 8531
23. S. Srivastava, K. Jain, V.N. Singh, S. Singh, N. Vijayan, N. Dilawar, G. Gupta, and T.D. Senguttuvan Nanotechnology 23 2012 205501
24. C. Feldmann Scr. Mater. 44 2001 2193 2196
25. C. Feldmann, and C. Metzmacher J. Mater. Chem. 11 2001 2603 2606
26. C. Feldmann Adv. Funct. Mater. 2 2003 101 107
27. G.M. Vest Mater. Res. Soc. Symp. Proc. 60 1986 35
28. P. Van Geloven, J. Moons, M. Honore, and J. Roggen Sens. Actuators 17 1989 361
29. P.P. Tsai, I.C. Chen, and M.H. Tzeng MRL Bull. Res. Dev. 6 1992 67 72
30. P.P. Tsai, I.C. Chen, and M.H. Tzeng Sens. Actuators B 13-14 1993 610 612
31. P.P. Tsai, I.C. Chen, and M.H. Tzeng Tin oxide (SnOx) carbon monoxide sensor fabricated film methods, Sens. Actuators B 24-25 1995 537 539
32. H.T. Sun, C. Cantalini, L. Lozzi, M. Passacantando, S. Santucci, and M. Pelino Thin Film Devices, Sensors and Actuators, Thin Solid Films 287 1996 258 265
33. Y.G. Choi, G. Sakai, K. Shimanoe, N. Miura, and N. Yamazoe Sens. Actuators B 95 2003 258 265
34. W.S. Hummers, and R.E. Offeman J. Am. Chem. Soc. 80 1958 1339
35. P. Porkodi, V. Yegnaraman, and D. Jeyakumar Mater. Res. Bull. 41 2006 1476 1486
36. A.B. Bourlinos, D. Gournis, D. Petridis, T. Szabó, A. Szeri, and I. Dékány Langmuir 19 2003 6050 6055
37. http://www.icdd.com/products/overview.htm
38. B.Y. Wei, M.C. Hsu, P.G. Su, H.M. Lin, R.J. Wu, and H.J. Lai Sens. Actuators B 101 2004 81 89
39. P.G. Su, and T.T. Pan Mater. Chem. Phys. 125 2011 351 357