The proliferation of silicon germanium

European Solid-State Device Research Conference

Volumn , Issue , 2000, Pages 88-91

  Schuppen, A ^a   Tortschanoff, M ^a   Berntgen, J ^a   Maier, P ^a   Zerrweck, D ^a   Von Der Ropp, H ^a   Tolonics, J ^a   Burger, K ^a  

^a Vishay   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BICMOS TECHNOLOGY; FLIP CHIP DEVICES; SILICON ALLOYS; SILICON WAFERS; SOLID STATE DEVICES;

FLIP CHIP TECHNOLOGIES; FREQUENCY SCALE; HIGH RELIABILITY; HIGHER FREQUENCIES; LOW VOLTAGES; SIGE TECHNOLOGY; SILICON GERMANIUM; TRANSIT FREQUENCY;

HETEROJUNCTION BIPOLAR TRANSISTORS;

EID: 84907859551     PISSN: 19308876     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDERC.2000.194723     Document Type: Conference Paper

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