Formic Acid Electrooxidation on Noble-Metal Electrodes: Role and Mechanistic Implications of pH, Surface Structure, and Anion Adsorption

ChemElectroChem

Volumn 1, Issue 6, 2014, Pages 1075-1083

  Brimaud, Sylvain ^a   Solla Gullón, José ^b   Weber, Isabella ^a   Feliu, Juan M ^b   Behm, R Jürgen ^a  

^a UNIVERSITY OF ULM   (Germany)

^b UNIVERSITY OF ALICANTE   (Spain)

Author keywords

Formic acid oxidation; Gold; Ph effect; Platinum; Reaction mechanism

Indexed keywords

CATALYST ACTIVITY; CATALYTIC OXIDATION; ELECTROLYTES; ELECTROOXIDATION; FORMIC ACID; GOLD; OXIDATION; PH EFFECTS; PLATINUM; PRECIOUS METALS; SURFACE REACTIONS; SURFACE STRUCTURE;

FORMIC ACID ELECTROOXIDATION; FORMIC ACID OXIDATION; MECHANISTIC STUDIES; MOLECULAR HYDROGEN; NOBLE METAL ELECTRODES; OXIDATION CURRENTS; REACTION CONDITIONS; REACTION MECHANISM;

ELECTRODES;

EID: 84907559896     PISSN: None     EISSN: 21960216     Source Type: Journal    
DOI: 10.1002/celc.201400011     Document Type: Article

References (34)

1. A. Capon, R. Parsons, J. Electroanal. Chem. 1973, 44, 239-254.
2. A. Miki, S. Ye, M. Osawa, Chem. Commun. 2002, 1500-1501.
3. A. Cuesta, G. Cabello, M. Osawa, C. Gutiérrez, ACS Catal. 2012, 2, 728-738.
4. A. Cuesta, G. Cabello, F. W. Hartl, M. Escudero-Escribano, C. Vaz-Domínguez, L. A. Kibler, M. Osawa, C. Gutiérrez, Catal. Today 2013, 202, 79-86.
5. A. Cuesta, G. Cabello, C. Gutiérrez, M. Osawa, Phys. Chem. Chem. Phys. 2011, 13, 20091-20095.
6. M. Osawa, K. Komatsu, G. Samjeské, T. Uchida, T. Ikeshoji, A. Cuesta, C. Gutiérrez, Angew. Chem. Int. Ed. 2011, 50, 1159-1163; Angew. Chem. 2011, 123, 1191-1195.
7. G. Samjeské, M. Osawa, Angew. Chem. Int. Ed. 2005, 44, 5694-5698; Angew. Chem. 2005, 117, 5840-5844.
8. G. Samjeské, A. Miki, S. Ye, M. Osawa, J. Phys. Chem. B 2006, 110, 16559-16566.
9. Y.-X. Chen, M. Heinen, Z. Jusys, R. J. Behm, ChemPhysChem 2007, 8, 380-385.
10. Y.-X. Chen, M. Heinen, Z. Jusys, R. J. Behm, Langmuir 2006, 22, 10399-10408.
11. Y.-X. Chen, M. Heinen, Z. Jusys, R. J. Behm, Angew. Chem. Int. Ed. 2006, 45, 981-985; Angew. Chem. 2006, 118, 995-1000.
12. J. Xu, D. Yuan, F. Yang, D. Mei, Z. Zhang, Y. X. Chen, Phys. Chem. Chem. Phys. 2013, 15, 4367-4376.
13. W. Gao, J. A. Keith, J. Anton, T. Jacob, J. Am. Chem. Soc. 2010, 132, 18377-18385.
14. M. Neurock, M. Janik, A. Wieckowski, Faraday Discuss. 2009, 140, 363-378.
15. J. Joo, T. Uchida, A. Cuesta, M. T. M. Koper, M. Osawa, J. Amer. Chem. Soc. 2013, 135, 9991-9994.
16. J. Solla-Gullón, A. Aldaz, J. Clavilier, Electrochim. Acta 2013, 87, 669-675.
17. H. Angerstein-Kozlowska, B. E. Conway, A. Hamelin, J. Electroanal. Chem. 1990, 277, 233-252.
18. V. Grozovski, J. Solla-Gullon, V. Climent, E. Herrero, J. M. Feliu, J. Phys. Chem. C 2010, 114, 13802-13812.
19. G. J. Edens, A. Hamelin, M. J. Weaver, J. Phys. Chem. 1996, 100, 2322-2329.
20. S.-C. Chang, A. Hamelin, M. J. Weaver, J. Chem. Phys. 1991, 95, 5560-5567.
21. S. Brimaud, Z. Jusys, R. J. Behm, Electrocatal. 2011, 2, 69-74.
22. G. Crépy, C. Lamy, S. Maximovitch, J. Electroanal. Chem. 1974, 54, 161-179.
23. G. L. Beltramo, T. E. Shubina, M. T. M. Koper, ChemPhysChem 2005, 6, 2597-2606.
24. A. Wiéckowski, J. Electroanal. Chem. 1977, 78, 229-241.
25. A. Couto, A. Rincón, M. C. Perez, C. Gutierrez, Electrochim. Acta 2001, 46, 1285-1296.
26. R. Gisbert, G. García, M. T. M. Koper, Electrochim. Acta 2011, 56, 2443-2449.
27. J. L. Haan, R. I. Masel, Electrochim. Acta 2009, 54, 4073-4078.
28. H. Kita, T. Katagiri, K. Kunimatsu, J. Electroanal. Chem. 1987, 220, 125-138.
29. A. Hamelin, C. M. Lamy, S. Maximovitch, M. G. Champetier, C. R. Acad. Sc. Paris Série C 1976, 282, 403.
30. A. Hamelin, Y. Ho, S. C. Chang, X. Gao, M. J. Weaver, Langmuir 1992, 8, 975-981.
31. V. Grozovski, F. J. Vidal-Iglesias, E. Herrero, J. M. Feliu, ChemPhysChem 2011, 12, 1641-1644.
32. G. Q. Lu, A. Crown, A. Wieckowski, J. Phys. Chem. B 1999, 103, 9700-9711.
33. Y.-X. Chen, S. Ye, M. Heinen, Z. Jusys, M. Osawa, R. J. Behm, J. Phys. Chem. B 2006, 110, 9534-9544.
34. A. Rodes, E. Herrero, J. M. Feliu, A. Aldaz, J. Chem. Soc. Faraday Trans. 1996, 92, 3769-3776.