Thermal issues in a backwafer contacted silicon-on-glass integrated bipolar process

2001 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems, SiRF 2001

Volumn , Issue , 2001, Pages 114-121

  Nenadovic, N ^a   Nanver, L K ^a   Schellevis, H ^a   Van Zeijl, H W ^b   Slotboom, J W ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

Contact resistance; Equations; Heating; Immune system; Lattices; Measurement techniques; Medical simulation; Silicon; Temperature; Thermal resistance

Indexed keywords

CONTACT RESISTANCE; CRYSTAL LATTICES; ELECTRIC RESISTANCE; FABRICATION; GLASS; HEAT RESISTANCE; HEATING; IMMUNE SYSTEM; INTEGRATED CIRCUITS; SILICON; TEMPERATURE;

2D MEDICI SIMULATION; EQUATIONS; MEASUREMENT TECHNIQUES; MEDICAL SIMULATIONS; SERIES RESISTANCES; SILICON ON GLASS; TEMPERATURE RISE; THERMAL BEHAVIORS;

MONOLITHIC INTEGRATED CIRCUITS;

EID: 84906717537     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SMIC.2001.942351     Document Type: Conference Paper

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