Selective removal of Hg(II) with polyacrylonitrile-2-amino-1,3,4-thiadiazole chelating resin: Batch and column study

Chemical Engineering Journal

Volumn 259, Issue , 2015, Pages 257-265

  Xiong, Chunhua ^a   Li, Yanli ^a   Wang, Guotao ^a   Fang, Lei ^b   Zhou, Suguo ^a   Yao, Caiping ^a   Chen, Qing ^a   Zheng, Xuming ^c   Qi, Dongming ^c   Fu, Yaqin ^c   Zhu, Yaofeng ^c  

^a ZHEJIANG GONGSHANG UNIVERSITY   (China)

^b UNIVERSITY OF FLORIDA   (United States)

^c ZHEJIANG SCI TECH UNIVERSITY   (China)

Author keywords

Adsorption; Chelating resin; FT IR; Hg(II); Polyacrylonitrile

Indexed keywords

ADSORPTION; METAL COMPLEXES; ORGANIC COMPOUNDS; POLYACRYLONITRILES; X RAY SPECTROSCOPY;

ADSORPTION CAPACITIES; ADSORPTION KINETICS; ADSORPTION PROPERTIES; CHELATING RESIN; ENERGY DISPERSIVE X RAY SPECTROSCOPY; FT-IR; LANGMUIR ISOTHERM MODELS; PSEUDO-SECOND ORDER MODEL; COLUMN STUDY; SELECTIVE REMOVAL;

ION EXCHANGE RESINS; ADSORPTION;

EID: 84906500500     PISSN: 13858947     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cej.2014.07.114     Document Type: Article

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