Stress stabilization of a new ferroelectric phase incorporated into SrTaO2N thin films

Journal of Applied Physics

Volumn 116, Issue 5, 2014, Pages

  Zhu, Wenliang ^a,b   Kamisaka, Hideyuki ^c,d   Oka, Daichi ^c,d   Hirose, Yasushi ^c,d,e   Leto, Andrea ^f   Hasegawa, Tetsuya ^c,d,e   Pezzotti, Giuseppe ^a  

^a KYOTO INSTITUTE OF TECHNOLOGY   (Japan)

^b OSAKA UNIVERSITY MEDICAL SCHOOL   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

^d JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^e KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^f Piezotech Japan Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FERROELECTRICITY; STABILIZATION; THIN FILMS;

BAND GAP ENERGY; CATHODOLUMINESCENCE SPECTROSCOPY; FERROELECTRIC PHASE; FILM STRUCTURE; FIRST-PRINCIPLES CALCULATION; HIGH COMPRESSIVE RESIDUAL STRESS; LOCAL STRESS STATE; MICROSTRUCTURAL ANALYSIS;

FERROELECTRIC FILMS;

EID: 84905973096     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.4891981     Document Type: Article

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