Etching process of silicon carbide from polysiloxane by chlorine

Corrosion Science

Volumn 87, Issue , 2014, Pages 127-133

  Duan, Liqun ^a   Ma, Qingsong ^a   Chen, Zhaohui ^a  

^a NATIONAL UNIVERSITY OF DEFENSE TECHNOLOGY   (China)

Author keywords

A. Ceramic; B. IR spectroscopy; B. Raman spectroscopy; B. X ray diffraction; B. XPS; C. Chlorination

Indexed keywords

CHLORINATION; CHLORINE; SILICON CARBIDE; SILICONES; X RAY DIFFRACTION; CERAMIC MATERIALS; PORE SIZE; SILICON;

A. CERAMIC; CARBIDE DERIVED CARBON; CORE SHELL STRUCTURE; ETCHING MECHANISM; ETCHING PROCESS; ETCHING RATE; ETCHING TEMPERATURE; SILOXANE RESINS; INTERFACE REACTIONS; SHELL STRUCTURE;

ETCHING;

EID: 84905400706     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.corsci.2014.06.014     Document Type: Article

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