Scanning atmospheric plasma processes for surface decontamination and superhydrophobic deposition

ACS Symposium Series

Volumn 1016, Issue , 2009, Pages 323-336

  Kim, Seong H ^a   Kim, Jeong Hoon ^b   Kang, Bang Kwon ^c  

^a The Pennsylvania State University   (United States)

^b APPLASMA   (United States)

^c Ajou University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DECONTAMINATION; ELECTRODES; HYDROPHOBICITY; NANOSCIENCE; NITROGEN PLASMA; PLASMA SOURCES; PROTECTIVE COATINGS;

ATMOSPHERIC PLASMAS; CYLINDRICAL ELECTRODES; DIELECTRIC BARRIER DISCHARGES; IN-SITU SPECTROSCOPIC TECHNIQUES; RADIO FREQUENCY PLASMA; SUPERHYDROPHOBIC COATINGS; SURFACE DECONTAMINATION; VARIOUS SUBSTRATES;

DEPOSITION;

EID: 84904802842     PISSN: 00976156     EISSN: 19475918     Source Type: Book Series    
DOI: 10.1021/bk-2009-1016.ch024     Document Type: Conference Paper

References (26)

1. Chu, P. K.; Chen, J. Y.; Wang, L. P.; Huang, N. Mater. Sci. Eng. 2002, R36, 143.
2. Moon, S. Y.; Choe, W.; Kang, B. K. Appl. Phys. Lett. 2004, 84, 188.
3. Zhu, W.-C.; Wang, B.-R.; Yao, Z.-X.; Pu, Y.-K. J. Phys. D: Appl. Phys. 2005, 38, 1396.
4. Yang, Y.-C.; Baker, J. A.; Ward, J. R. Chem. Rev. 1992, 92, 1729.
5. Herrmann, H. W.; Selwyn, G. S.; Henins, I.; Park, J.; Jeffery, M.; Williams, J. M. IEEE Trans. Plasma Sci. 2002, 30, 1460.
6. Rahul, R.; Stan, O.; Rahman, A.; Littlefield, E.; Hoshimiya, K.; Yalin, A. P.; Sharma, A.; Pruden, A.; Moore, C. A.; Yu. Z.; Collins, G. J. J. Phys. D. Appl. Phys. 2005, 38, 17501.
7. Birmingham, J. G. IEEE Trans. Plasma Sci. 2004, 32, 1526.
8. Laroussi, M. Plasma Processes & Polymers 2005, 2, 391.
9. Kim, S. H.; Kim, J.-H.; Kang, B.-K.; Uhm, H. S. Langmuir 2005, 21, 12213.
10. Kim, S. H.; Kim, J.-H.; Kang, B.-K. Langmuir 2007 23, 8074.
11. Pearse, R. W. B.; Gaydon, A. G. The Identification of Molecular Spectra; 4th ed. John Wiley & Sons, Inc.: New York, 1976.
12. Eliasson, B.; Hirth, M.; Kogelschatz, U. J. Phys. D: Appl. Phys. 1987, 20, 1421.
13. Ahn, H.-S.; Hayashi, N.; Ihara, S.; Yamabe, C. Jpn. J. Appl. Phys. 2003, 42, 6578.
14. Masui, T.; Hirai, H.; Imanaka, N.; Adachi, G. Phys. Stat. Sol. A 2003, 198, 364.
15. Panda, R. N.; Hsieh, M. F.; Chung, R. J.; Chin, T. S. J. Phys. Chem. Solids 2003, 64, 193.
16. Tkalcec, E.; Sauer, M.; Nonninger, R.; Schmidt, H. J. Mater. Sci. 2001, 36, 5253.
17. Kim, J.-H.; Liu, G.; Kim, S. H. J. Mater. Chem. 2006, 16, 977.
18. Kim, S. H.; Kim, J.-H.; Kang, B.-K. J. Vac. Sci. Technol. 2008, 26, 123.
19. Hopkins, J;. Badyal, J. P. S. Langmuir 1996, 12, 4205.
20. Wenzel, R. N. Ind. Eng. Chem. 1936, 28, 988.
21. Cassie, A. B. D.; Baxter, S. Tran. Faraday Soc. 1944, 40, 546.
22. Beamson, G.; Briggs, D. High Resolution XPS of Organic Polymers: The Scienta ESCA300 Database. John Wiley & Sons (New York: 1992).
23. Teare, D. O. H.; Spanos, C. G.; Ridley, P.; Kinmond, E. J.; Roucoules, V.; Badyal, J. P. S. Chem. Mater. 2002, 14, 4566.
24. Takahashi, K.; Tachibana, K. J. Vac. Sci. Technol. A 2001, 19, 2055.
25. Hollenstein, C. Plasma Phys. Control Fusion 2000, 42, R93.
26. Allcock, H. R.; Steely, L. B.; Kim, S. H.; Kim, J. H.; Kang, B.-K. Langmuir 2007, 23, 8103.