Reactive ion etching-assisted surface-enhanced Raman scattering measurements on the single nanoparticle level

Applied Physics Letters

Volumn 104, Issue 24, 2014, Pages

  Wang, Si Yi ^a   Jiang, Xiang Xu ^a   Xu, Ting Ting ^a,b   Wei, Xin Pan ^a   Lee, Shuit Tong ^a   He, Yao ^a  

^a SOOCHOW UNIVERSITY   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

FINITE DIFFERENCE TIME DOMAIN METHOD; GOLD NANOPARTICLES; NANOPARTICLES; RAMAN SCATTERING; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SUBSTRATES; SURFACE PLASMON RESONANCE; TIME DOMAIN ANALYSIS;

ENHANCEMENT FACTOR; FUNDAMENTAL RESEARCH; HIGH RESOLUTION; SERS SUBSTRATE; SINGLE NANOPARTICLE; SINGLE PARTICLE; SURFACE ENHANCED RAMAN SCATTERING (SERS); THEORETICAL CALCULATIONS;

SURFACE SCATTERING;

EID: 84903160315     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4884060     Document Type: Article

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