Redox supercapacitor performance of nanocrystalline molybdenum nitrides obtained by ammonolysis of chloride- and amide-derived precursors

Journal of Power Sources

Volumn 266, Issue , 2014, Pages 456-463

  Shah, S Imran U ^a   Hector, Andrew L ^a   Owen, John R ^a  

^a UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

Author keywords

Double layer; Molybdenum; Nitride; Redox; Supercapacitor

Indexed keywords

AMIDES; CAPACITORS; CHLORINE COMPOUNDS; MOLYBDENUM; NITRIDES; POROUS MATERIALS;

CYCLIC VOLTAMMOGRAMS; DOUBLE LAYERS; LATTICE DISTORTIONS; MODERATE TEMPERATURE; MOLYBDENUM NITRIDE; REDOX; REDOX SUPERCAPACITORS; SUPER CAPACITOR;

CAPACITANCE;

EID: 84902105370     PISSN: 03787753     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpowsour.2014.05.045     Document Type: Article

References (47)

1. M.B. Kanoun, S. Goumri-Said, and M. Jaouen Phys. Rev. B 76 2007 134109
2. A.Y. Ganin, L. Kienle, and G.V. Vajenine J. Solid State Chem. 179 2006 2339 2348
3. C.L. Bull, P.F. McMillan, E. Soignard, and K. Leinenweber J. Solid State Chem. 177 2004 1488 1492
4. D. McKay, J.S.J. Hargreaves, J.L. Rico, J.L. Rivera, and X.-L. Sun J. Solid State Chem. 181 2008 325 333
5. A.G. Cairns, J.G. Gallagher, J.S.J. Hargreaves, D. McKay, E. Morrison, J.L. Rico, and K. Wilson J. Alloys Compd. 479 2009 851 854
6. R. Marchand, F. Tessier, and F.J. DiSalvo J. Mater. Chem. 9 1999 297 304
7. H. He, H.X. Dai, K.Y. Ngan, and C.T. Au Catal. Lett. 71 2001 147 153
8. M.K. Neylon, S. Choi, H. Kwon, K.E. Curry, and L.T. Thompson Appl. Catal. A Gen. 183 1999 253 263
9. S.Z. Li, and J.S. Lee J. Catal. 178 1998 119 136 S.W. Gong, H.K. Chen, W. Li and B.Q. Li, Catal. Commun. 5 (2004) 621-624; T. Kadono, T. Kubota, Y. Okamoto, Catal. Today 87(2003) 107-115
10. S.Z. Li, and J.S. Lee J. Catal. 173 1998 134 144 S.Z. Li, J.S. Lee, T. Hyeon, K.S. Suslick, Appl. Catal. A: General 184 (1999) 1-9; M. Nagai, Y. Goto, A. Miyata, M. Kiyoshi, K. Hada, K. Oshikawa, S. Omi, J. Catal. 182(1999) 292-301
11. M. Nagae, T. Yoshio, Y. Takemoto, and J. Takada J. Am. Ceram. Soc. 84 2001 1175 1177
12. K. Inumaru, T. Nishikawa, K. Nakamura, and S. Yamanaka Chem. Mater. 20 2008 4756 4761
13. P. Hones, R. Sanjines, and F. Levy Surf. Coat. Technol. 94-95 1997 398 402
14. R. Fix, R.G. Gordon, and D.M. Hoffman Thin Solid Films 288 1996 116 119
15. W.-F. Chen, K. Sasaki, C. Ma, A.I. Frenkel, N. Marinkovic, J.T. Muckerman, Y.M. Zhu, and R.R. Adzic Angew. Chem. Int. Ed. 51 2012 6131 6135
16. P. Jampani, A. Manivannan, and P.N. Kumta ECS Interface 19 2010 57 62 S. Dong, X. Chen, X. Zhang, G. Cui, Coord. Chem. Rev. 257(2013) 1946-1956
17. D. Choi, G.E. Blomgren, and P.N. Kumta Adv. Mater. 18 2006 1178 1182
18. D. Finello New Developments in Ultracapacitor Technology, Report no. WL-TR-95-7024 1995 Wright Laboratory, Eglin Air Force Base Florida, USA
19. S.L. Roberson, D. Finello, and R.F. Davis J. Appl. Electrochem 29 1999 75 80
20. T.C. Liu, W.G. Pell, B.E. Conway, and S.L. Roberson J. Electrochem. Soc. 145 1998 1882 1888
21. C. Chen, D. Zhao, and X. Wang Mater. Chem. Phys. 97 2006 156 161
22. X.L. Li, Y. Xing, H. Wang, H.L. Wang, W.D. Wang, and X.Y. Chen Trans. Nonferrous Met. Soc. China 19 2009 620 625
23. D. Choi, and P.N. Kumta J. Am. Ceram. Soc. 94 2011 2371 2378
24. K.H. Lee, Y.W. Lee, A.R. Ko, G.Z. Cao, and K.W. Park J. Am. Ceram. Soc. 96 2013 37 39
25. G. Hägg Z. Phys. Chem. B7 1930 339 340
26. A. Wang, F. Capitain, V. Monnier, S. Matar, and G. Demazeau J. Mater. Synth. Proc. 5 1997 235 248
27. W. Lengauer J. Cryst. Growth 87 1988 295 298
28. R. Marchand, X. Gouin, F. Tessier, and Y. Laurent S.T. Oyama, The Chemistry of Transition Metal Carbides and Nitrides 1996 Blackie A&P Glasgow
29. S.T. Wang, X. Wang, Z.D. Zhang, and Y.T. Qian J. Mater. Sci. 38 2003 3473 3478
30. S.Z. Li, and J.S. Lee J. Catal. 162 1996 76 87 R.N. Panda, S. Kaskel, J. Mater. Sci. 41(2006) 2465-2470
31. S.L. Roberson, D. Finello, and R.F. Davis Thin Solid Films 324 1998 30 36 V. Miikkulainen, M. Suvanto. T.A. Pakkanen, Chem. Mater. 19(2007) 263-269; H. Kattelus, J. Koskenala, A. Nurmela, A. Niskanen, Microelec. Eng. 60 (2002) 97-105; Y. Wang, R.Y. Lin, Mater. Sci. Eng. B 112 (2004) 42-49; K. Inumaru, K. Baba, S. Yamanaka, Appl. Surf. Sci. 253 (2006) 2863-2869
32. X.D. Zhao, and K.J. Range J. Alloys Compd. 296 2000 72 74 C.L. Bull, T. Kawashima, P.F. McMillan, D. Machon, O. Shebanova, D. Daisenberger, E. Soignard, E. Takayama-Muromachi, L.C. Chapon, J. Solid State Chem. 179(2006) 1762-1767; T. Kawashima, E. Takayama-Muromachi, P.F. McMillan, Physica C 460 (2007) 651-652; K. Inumaru, T. Nishikawa, K. Nakamura, S. Yamanaka, Chem. Mater. 20 (2008) 4756-4761
33. B. Mazumder, and A.L. Hector J. Mater. Chem. 19 2009 4673 4686
34. P. Chirico, A.L. Hector, and B. Mazumder Dalt. Trans. 39 2010 6092 6097 B. Mazumder, P. Chirico, A.L. Hector, Inorg. Chem. 47(2008) 9684-9690
35. S.I.U. Shah, and A.L. Hector Top. Catal. 55 2012 950 954
36. S.T. Wang, Z.D. Zhang, Y.G. Zhang, and Y.T. Qian J. Solid State Chem. 177 2004 2756 2762
37. V. Miikkulainen, M. Suvanto, and T.A. Pakkanen Thin Solid Films 516 2008 6041 6047
38. D.V. Baxter, M.H. Chisholm, G.J. Gama, V.F. DiStasi, A.L. Hector, and I.P. Parkin Chem. Mater. 8 1996 1222 1228
39. A.W. Jackson, O. Shebanova, A.L. Hector, and P.F. McMillan J. Solid State Chem. 179 2006 1383 1393
40. A. Salamat, A.L. Hector, B.M. Gray, S.A.J. Kimber, P. Bouvier, and P.F. McMillan J. Am. Chem. Soc. 135 2013 9503 9511
41. A.L. Hector Chem. Soc. Rev. 36 2007 1745 1753 A.W. Jackson, A.L. Hector, J. Mater. Chem. 17(2007) 1016-1022; S. Hassan, A.L. Hector, J.R. Hyde, A. Kalaji, D.C. Smith, Chem. Commun. (2008) 5304-5306; B.M. Gray, S.Hassan, A.L. Hector, A. Kalaji, B. Mazumder, Chem. Mater. 21 (2009) 4210-4215; S. Hassan, A.L. Hector, A. Kalaji, J. Mater. Chem. 21 (2011) 6370-6374
42. M.H. Chisholm, F.A. Cotton, B.A. Frenz, W.W. Reichert, L.W. Shive, and B.R. Stults J. Am. Chem. Soc. 98 1976 4469 4476
43. A.C. Larson, and R.B. Von Dreele Generalized Structure Analysis System (GSAS), Los Alamos National Laboratory Report LAUR 2004 86 748 R.B. Von Dreele, A.C. Larson, GSAS manual, LANSCE MS-H805, Los Alamos National Laboratory, NM87545(2000); B.H. Toby, J. Appl. Cryst. 34 (2001) 210-213
44. ICSD accessed via The United Kingdom Chemical Database Service D.A. Fletcher, R.F. McMeeking, and D. Parkin J. Chem. Inf. Comput. Sci. 36 1996 746 749
45. S. Brunauer, P.H. Emmett, and E. Teller J. Am. Chem. Soc. 60 1938 309 319 E.P. Barrett, L.G. Joyner, P.P. Halenda, J. Am. Chem. Soc. 73(1951) 373-380
46. J.W. Li, D. Dzivenko, A. Zerr, C. Fasel, Y.P. Zhou, and R. Riedel Z. Anorg. Allg. Chem. 631 2005 1449 1455
47. R.N. Reddy, and R.G. Reddy J. Power Sources 156 2006 700 704