Effect of film morphology on the Li ion intercalation kinetics in anodic porous manganese dioxide thin films

Journal of Physical Chemistry C

Volumn 118, Issue 19, 2014, Pages 9889-9898

  Etman, Ahmed S ^a,b,c,d   Radisic, Aleksandar ^b   Emara, Mahmoud M ^c   Huyghebaert, Cedric ^b   Vereecken, Philippe M ^b,d  

^a KING ABDULAZIZ CITY FOR SCIENCE AND TECHNOLOGY   (Saudi Arabia)

^b IMEC   (Belgium)

^c Alexandria University Faculty Of Science   (Egypt)

^d UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FILM THICKNESS; IONS; MANGANESE OXIDE; THIN FILMS;

DEPOSITION CURRENT DENSITY; ELECTROCHEMICAL ACTIVITIES; ELECTROCHEMICAL CYCLING; ELECTROCHEMICAL PERFORMANCE; ELECTROLYTIC MANGANESE DIOXIDES; LITHIUM ION INTERCALATIONS; RUTHERFORD BACK-SCATTERING; STRUCTURE AND MORPHOLOGY;

LITHIUM;

EID: 84900817067     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp4105008     Document Type: Article

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