Chronoamperometric versus galvanostatic preparation of manganese oxides for electrochemical capacitors

Journal of the Electrochemical Society

Volumn 158, Issue 10, 2011, Pages

  Cross, Andrew D ^a   Morel, Alban ^b   Hollenkamp, Tony F ^c   Donne, Scott W ^a  

^a UNIVERSITY OF NEWCASTLE   (Australia)

^b UNIVERSITÉ DE NANTES   (France)

^c CSIRO   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE PASSED; DEPOSIT MORPHOLOGY; ELECTROCHEMICAL CAPACITOR; GALVANOSTATIC METHODS; GALVANOSTATICS; INTERMEDIATE SPECIE; MANGANESE DIOXIDE; MANGANESE DIOXIDE DEPOSITION; MANGANESE DIOXIDE ELECTRODES; OXYGEN EVOLUTION; SPECIFIC CAPACITANCE; SUPERCAPACITOR APPLICATION;

CHRONOAMPEROMETRY; ELECTROCHEMICAL ELECTRODES; ELECTRODEPOSITION; ELECTROLYTIC CAPACITORS; MANGANESE;

MANGANESE OXIDE;

EID: 80052092757     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3625581     Document Type: Article

References (24)

1. http://www.eia.doe.gov/oiaf/ieo/world.html, accessed April 14, 2011.
2. A. Sari and K. Kaygusuz, Sol. Energy, 71, 365 (2001). 10.1016/S0038-092X(01)00075-5 (Pubitemid 33056115)
3. R. F. Post, K. Fowler, and S. F. Post, Proc. IEEE, 81, 462 (1993). 10.1109/5.241483 (Pubitemid 23688318)
4. D. Ragone in Proceedings of Society of Automotive Engineers Conference, Detroit, MI, May (1968).
5. J. P. Zheng and T. R. Jow, J. Electrochem. Soc., 142, L6 (1995). 10.1149/1.2043984
6. H. H. Kim and K. B. Kim, Electrochem. Solid-State Lett., 4, A62 (2001). 10.1149/1.1359956
7. J. K. Chang and W. T. Tsai, J. Electrochem. Soc., 150, A1333 (2003). 10.1149/1.1605744
8. C. C. Hu and T. W. Tsou, J. Power Sources, 115, 179 (2003). 10.1016/S0378-7753(02)00647-X (Pubitemid 41325513)
9. J. W. Long, A. L. Young, and D. R. Rolison, J Electrochem. Soc., 150, A1161 (2003). 10.1149/1.1593651
10. H. Kim and B. N. Popov, J. Electrochem. Soc., 150, D56 (2003). 10.1149/1.1541675
11. R. N. Reddy and R. G. Reddy, J. Power Sources, 124, 330 (2003). 10.1016/S0378-7753(03)00600-1 (Pubitemid 41325837)
12. N. L. Wu, Mater. Chem. Phys., 75, 6 (2002). 10.1016/S0254-0584(02)00022-6 (Pubitemid 34249334)
13. V. Srinivasan and J. W. Weidner, J. Electrochem. Soc., 144, L220 (1997). 10.1149/1.1837859
14. H. K. Kim, T. Y. Seong, J. H. Lim, W. I. Cho, and Y. S. Yoon, J. Power Sources, 102, 167 (2001). 10.1016/S0378-7753(01)00864-3 (Pubitemid 34086221)
15. J. P. Zheng, P. J. Cygan, and T. R. Jow, J. Electrochem. Soc., 142, 2699 (1995). 10.1149/1.2050077
16. J. P. Zheng, Electrochem. Solid-State Lett., 2, 359 (1999). 10.1149/1.1390837
17. M. C. Santos, A. J. Terezo, V. C. Fernandes, E. C. Pereira, and L. O. S. Bullhoes, J. Solid State Electrochem., 9, 91 (2005). 10.1007/s10008-004-0512-2 (Pubitemid 40238408)
18. Y.-G. Wang, Z.-D. Wang, and Y.-Y. Xia, Electrochim. Acta, 50, 5641 (2005). 10.1016/j.electacta.2005.03.042 (Pubitemid 41329210)
19. B.-O. Park, C. D. Lokhande, H.-S. Park, K.-D. Jung, and O.-S. Joo, J. Mater. Sci., 39, 4313 (2004). 10.1023/B:JMSC.0000033415.47096.db
20. X.-F. Wang, Z. You, and D.-B. Ruan, Chin. J. Chem., 24, 1126 (2006). 10.1002/cjoc.v24:9
21. M. S. Hong, S. H. Lee, and S. W. Kim, Electrochem. Solid-State Lett., 5, A227 (2002). 10.1149/1.1506463 (Pubitemid 35186316)
22. A. D. Cross, A. Morel, A. Cormie, A. F. Hollenkamp, and S. W. Donne, J. Power Sources, 196, 7847 (2011).
23. A. J. Bard and L. R. Faulkner, Fundamentals of Electrochemistry, 2nd ed., John Wiley Sons: New York, (2001).
24. D. Wakeham, S. W. Donne, W. J. Belcher, and P. C. Dastoor, Synth. Met., 158, 661 (2008). 10.1016/j.synthmet.2008.04.022