Three-dimensional laser lithography: Finer features faster

2013 Conference on Lasers and Electro-Optics Europe and International Quantum Electronics Conference, CLEO/Europe-IQEC 2013

Volumn , Issue , 2013, Pages

  Waller, E ^a   Renner, M ^a   Thiel, M ^b   Radke, A ^b   Von Freymann, G ^a,b  

^a Rheinland Pfälzische Technische Universität Kaiserslautern Landau   (Germany)

^b NANOSCRIBE GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; LITHOGRAPHY; PHOTORESISTS; QUANTUM ELECTRONICS; THREE DIMENSIONAL; TWO PHOTON PROCESSES;

DIRECT LASER WRITING; FEATURE SIZES; LASER LITHOGRAPHY; NUMERICAL APERTURE; OBJECTIVE LENS; OIL IMMERSION; PHOTONIC STRUCTURE; TWO-PHOTON ABSORPTIONS;

ELECTRON OPTICS;

EID: 84900296537     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/CLEOE-IQEC.2013.6801544     Document Type: Conference Paper

References (3)

1. see http://www. nanoscribe. de
2. G. von Freymann, A. Ledermann, M. Thiel, I. Staude, S. Essig, K. Busch, and M. Wegener., Advanced Functional Materials 20, 1038 (2010)
3. E. Waller, M. Renner, and G. von Freymann, Optics Express 20, 24949 (2012)