Photoinduced C-C reactions on insulators toward photolithography of graphene nanoarchitectures

Journal of the American Chemical Society

Volumn 136, Issue 12, 2014, Pages 4651-4658

  Palma, Carlos Andres ^a   Diller, Katharina ^a   Berger, Reinhard ^b   Welle, Alexander ^c   Björk, Jonas ^d   Cabellos, Jose Luis ^e   Mowbray, Duncan J ^e   Papageorgiou, Anthoula C ^a   Ivleva, Natalia P ^a   Matich, Sonja ^f   Margapoti, Emanuela ^f   Niessner, Reinhard ^a   Menges, Bernhard ^b   Reichert, Joachim ^a   Feng, Xinliang ^b   Räder, Hans Joachim ^b   Klappenberger, Florian ^a   Rubio, Angel ^e,g   Müllen, Klaus ^b   Barth, Johannes V ^a  

^a TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^b MAX PLANCK INSTITUTE FOR POLYMER RESEARCH   (Germany)

^c KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^d LINKÖPING UNIVERSITY   (Sweden)

^e UNIVERSITY OF THE BASQUE COUNTRY UPV EHU   (Spain)

^f WALTER SCHOTTKY INSTITUT   (Germany)

^g FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; MASS SPECTROMETRY; PHOTOELECTRONS; PHOTOIONIZATION; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE CHEMISTRY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON PRECURSORS; COMPLEX ARCHITECTURES; COVALENT COUPLINGS; INSULATING SURFACES; LASER DESORPTION IONIZATION; LITHOGRAPHIC METHODS; NANOARCHITECTURES; SEMICONDUCTOR INDUSTRY;

GRAPHENE;

BROMINE; CARBON; GRAPHENE; NANOMATERIAL;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMICAL REACTION; CHEMICAL STRUCTURE; COVALENT BOND; DENSITY FUNCTIONAL THEORY; MACROMOLECULE; MASS SPECTROMETRY; MATRIX ASSISTED LASER DESORPTION IONIZATION TIME OF FLIGHT MASS SPECTROMETRY; PHOTOLITHOTROPH; RAMAN SPECTROMETRY; UNDER ULTRAHIGH VACUUM; VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84897037287     PISSN: 00027863     EISSN: 15205126     Source Type: Journal    
DOI: 10.1021/ja412868w     Document Type: Article

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