Electrochemical characteristics of amorphous silicon thin film electrode with fluoroethylene carbonate additive

Current Applied Physics

Volumn 14, Issue 4, 2014, Pages 596-602

  Kim, Jung Sub ^a,b   Byun, Dongjin ^b   Lee, Joong Kee ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Korea University   (South Korea)

Author keywords

Amorphous materials; Chemical vapor deposition; Interface; Thin films

Indexed keywords

AMORPHOUS SILICON THIN FILMS; COMPOSITIONAL CHANGES; COULOMBIC EFFICIENCY; DISCHARGE CAPACITIES; ELECTROCHEMICAL CHARACTERISTICS; ELECTROCHEMICAL PERFORMANCE; FLUOROETHYLENE CARBONATES; SOLID ELECTROLYTE INTERPHASE LAYER (SEI);

AMORPHOUS MATERIALS; CHEMICAL VAPOR DEPOSITION; INTERFACES (MATERIALS); SEEBECK EFFECT; SOLID ELECTROLYTES; THIN FILMS;

LITHIUM;

EID: 84896784865     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2014.02.008     Document Type: Article

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