Electrochemical deposition of very smooth lithium using nonaqueous electrolytes containing HF

Journal of the Electrochemical Society

Volumn 143, Issue 7, 1996, Pages 2187-2197

  Kanamura, Kiyoshi ^a,b   Shiraishi, Soshi ^a   Takehara, Zen Ichiro ^a,b  

^a KYOTO UNIVERSITY   (Japan)

^b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; CURRENT DENSITY; ELECTROCHEMISTRY; ELECTRODEPOSITION; HYDROFLUORIC ACID; MORPHOLOGY; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRODEPOSITION CURRENT; ELECTRODEPOSITION RATE; LITHIUM SURFACE STATE;

LITHIUM;

EID: 0030192802     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836979     Document Type: Article

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