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Volumn 15, Issue 2, 2014, Pages 533-540

Vertically aligned peptide nanostructures using plasma-enhanced chemical vapor deposition

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL AND PHYSICAL PROPERTIES; DEPOSITION PROCESS; DISCHARGE PARAMETERS; SOLVENT FREE; UNIFORM ARRAY; VERTICALLY ALIGNED;

EID: 84896773919     PISSN: 15257797     EISSN: 15264602     Source Type: Journal    
DOI: 10.1021/bm401491k     Document Type: Article
Times cited : (40)

References (41)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.