-
1
-
-
84894516559
-
The influence of the mole ratio of trichlorosilane to silicon tetrachloride on polysilicon yield
-
(in Chinese).
-
G.L. Ding "The influence of the mole ratio of trichlorosilane to silicon tetrachloride on polysilicon yield" Sichuan Nonferrous Metals 3 1998 14 19 (in Chinese).
-
(1998)
Sichuan Nonferrous Metals
, Issue.3
, pp. 14-19
-
-
Ding, G.L.1
-
2
-
-
56849131074
-
The production technology of eletronic grade polycrystalline silicon
-
(in Chinese).
-
J.W. Liang "The production technology of eletronic grade polycrystalline silicon" Chin. Eng. Sci. 2 12 2000 34 39 (in Chinese).
-
(2000)
Chin. Eng. Sci.
, vol.2
, Issue.12
, pp. 34-39
-
-
Liang, J.W.1
-
3
-
-
33749408421
-
Preparation of trichlorosilane by plasma hydrogenation of silicon tetrachloride
-
A.V. Gusev, R.A. Kornev, A.Y. Sukhanov "Preparation of trichlorosilane by plasma hydrogenation of silicon tetrachloride" Inorg. Mater. 42 9 2006 1023 1026
-
(2006)
Inorg. Mater.
, vol.42
, Issue.9
, pp. 1023-1026
-
-
Gusev, A.V.1
Kornev, R.A.2
Sukhanov, A.Y.3
-
5
-
-
77952129085
-
Preparation of trichlorosilane from hydrogenation of silicon tetrachloride in thermal plasma
-
Q.Y. Wu, H.B. Chen, Y.L. Li, X.M. Tao, Z.J. Huang, S.Y. Shang, Y.X. Yin, X.Y. Dai "Preparation of trichlorosilane from hydrogenation of silicon tetrachloride in thermal plasma" Inorg. Mater. 46 3 2009 251 254
-
(2009)
Inorg. Mater.
, vol.46
, Issue.3
, pp. 251-254
-
-
Wu, Q.Y.1
Chen, H.B.2
Li, Y.L.3
Tao, X.M.4
Huang, Z.J.5
Shang, S.Y.6
Yin, Y.X.7
Dai, X.Y.8
-
6
-
-
84929752052
-
-
Cambrige University Press New York
-
A. Fridman Plasma Chemistry 2008 Cambrige University Press New York
-
(2008)
Plasma Chemistry
-
-
Fridman, A.1
-
7
-
-
69949088082
-
Destruction of freon HFC-134a using a nozzleless microwave plasma source
-
M. Jasinski, M. Dors, J. Mizeraczyk "Destruction of freon HFC-134a using a nozzleless microwave plasma source" Plasma Chem. Plasma Proc. 29 2009 363 372
-
(2009)
Plasma Chem. Plasma Proc.
, vol.29
, pp. 363-372
-
-
Jasinski, M.1
Dors, M.2
Mizeraczyk, J.3
-
8
-
-
73849089057
-
Decomposition of silicon tetrachloride by microwave plasma jet at atmospheric pressure
-
L.F. Wu, Z.B. Ma, A.H. He, J.H. Wang "Decomposition of silicon tetrachloride by microwave plasma jet at atmospheric pressure" Inorg. Mater. 45 2009 1403 1407
-
(2009)
Inorg. Mater.
, vol.45
, pp. 1403-1407
-
-
Wu, L.F.1
Ma, Z.B.2
He, A.H.3
Wang, J.H.4
-
9
-
-
43049168444
-
Production of hydrogen via methane reforming using atmospheric pressure microwave plasma
-
M. Jasimski, M. Dors, J. Mizeraczyk "Production of hydrogen via methane reforming using atmospheric pressure microwave plasma" J. Power Sources 181 2008 41 45
-
(2008)
J. Power Sources
, vol.181
, pp. 41-45
-
-
Jasimski, M.1
Dors, M.2
Mizeraczyk, J.3
-
10
-
-
0000778255
-
Synthesis of ammonia in high-frenquency discharges. II. Synthesis of ammonia in a microwave discharge under various conditions
-
H. Uyama, O. Matsumoto "Synthesis of ammonia in high-frenquency discharges. II. Synthesis of ammonia in a microwave discharge under various conditions" Plasma Chem. Plasma Proc. 9 3 1989 421 432
-
(1989)
Plasma Chem. Plasma Proc.
, vol.9
, Issue.3
, pp. 421-432
-
-
Uyama, H.1
Matsumoto, O.2
-
11
-
-
0029264164
-
Methane conversion by an air microwave plasma
-
A. Oumghar, J.C. Legrand, A.M. Diamy, N. Turillon "Methane conversion by an air microwave plasma" Plasma Chem. Plasma Proc. 15 1 1995 87 107
-
(1995)
Plasma Chem. Plasma Proc.
, vol.15
, Issue.1
, pp. 87-107
-
-
Oumghar, A.1
Legrand, J.C.2
Diamy, A.M.3
Turillon, N.4
-
12
-
-
78649632302
-
Improved microwave plasma cavity reactor for diamond synthesis at high-pressure and high power density
-
K.W. Hemawan, T.A. Grotjohn, D.K. Reinhard, J. Asmussen "Improved microwave plasma cavity reactor for diamond synthesis at high-pressure and high power density" Diam. Relat. Mater. 19 2010 1446 1452
-
(2010)
Diam. Relat. Mater.
, vol.19
, pp. 1446-1452
-
-
Hemawan, K.W.1
Grotjohn, T.A.2
Reinhard, D.K.3
Asmussen, J.4
-
13
-
-
18444382674
-
Scaling behavior of microwave reactors and discharge size for diamond deposition
-
T. Grotjohn, R. Liske, K. Hassouni, J. Asmussen "Scaling behavior of microwave reactors and discharge size for diamond deposition" Diam. Relat. Mater. 14 2005 288 291
-
(2005)
Diam. Relat. Mater.
, vol.14
, pp. 288-291
-
-
Grotjohn, T.1
Liske, R.2
Hassouni, K.3
Asmussen, J.4
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