Capitalising on the precisions of ion implantation and ink jetted fine gridline to create low-cost high efficiency silicon solar cells

Energy Procedia

Volumn 33, Issue , 2013, Pages 24-32

  Ebong, Abasifreke ^a   Gililov, Dani ^b   Lavid, Lior ^b   Krispil, Shlomi ^b   Thygelbaum, Stanislav ^b   Dovrat, Miki ^b   Wang, Yizhe ^c   Jin, Guangyao ^c   Zhou, Timothy ^d  

^a University of North Carolina at Charlotte   (United States)

^b Xjet Solar Ltd   (Israel)

^c Oriental Semiconductor Technology Company Ltd   (China)

^d Shanghai Shenzhou New Energy Co Ltd   (China)

Author keywords

Fine gridlines; High sheet resistance; Ink jetted gridline; Inkjet printing; Ion implant; Ion implantation; Ion implanter

Indexed keywords

EID: 84894488545     PISSN: 18766102     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1016/j.egypro.2013.05.036     Document Type: Conference Paper

References (5)

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