High-throughput ion-implantation for low-cost high-efficiency silicon solar cells

Energy Procedia

Volumn 15, Issue , 2012, Pages 10-19

  Rohatgi, Ajeet ^a,b   Meier, Daniel L ^a   McPherson, Bruce ^a   Ok, Young Woo ^b   Upadhyaya, Ajay D ^b   Lai, Jiun Hong ^b   Zimbardi, Francesco ^b  

^a Suniva Inc   (United States)

^b GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Advanced cell structures; Back junction cell; Bifacial cell; High efficiency; Implantation; P and n base solar cell

Indexed keywords

BIFACIAL CELL; CELL STRUCTURE; FRONT SURFACES; HIGH-THROUGHPUT; HIGH-VOLUME MANUFACTURING; IN-SITU; ION IMPLANTED; JUNCTION CELLS; ONE STEP; PHOSPHORUS-DOPED; PRODUCTION CELLS; SCREEN-PRINTED; SELECTIVE EMITTERS;

FABRICATION; ION IMPLANTATION; IONS; PASSIVATION; PHOSPHORUS; SILICON SOLAR CELLS;

EFFICIENCY;

EID: 84860504651     PISSN: 18766102     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1016/j.egypro.2012.02.002     Document Type: Conference Paper

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