Theoretical study of the adsorption of CHO radicals on hexagonal boron nitride sheet: Structural and electronic changes

Applied Surface Science

Volumn 295, Issue , 2014, Pages 137-143

  Tian, Yu ^a   Pan, Xiao Fan ^b   Liu, Yue Jie ^a   Zhao, Jing Xiang ^a  

^a HARBIN NORMAL UNIVERSITY   (China)

^b PetroChina SiChuan   (China)

Author keywords

Boron nitride sheet; CHO radical; DFT; Functionalization

Indexed keywords

ADSORPTION; DENSITY FUNCTIONAL THEORY; ELECTRONIC PROPERTIES; ENERGY GAP; III-V SEMICONDUCTORS; NITRIDES;

ADSORPTION ENERGIES; BORON NITRIDE SHEETS; CHO RADICAL; ELECTRICAL CONDUCTIVITY; FUNCTIONALIZATIONS; GEOMETRICAL STRUCTURE; HEXAGONAL BORON NITRIDE; SURFACE CHEMISORPTION;

BORON NITRIDE;

EID: 84894045855     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2014.01.017     Document Type: Article

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