A microlens direct-write concept for lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3048, Issue , 1997, Pages 346-355

  Davidson, Mark ^a  

^a Spectel Company   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTINUOUS WAVE LASERS; PHOTOLITHOGRAPHY; PIXELS; YTTRIUM ALUMINUM GARNET;

FREQUENCY QUADRUPLING; FUNDAMENTAL PRINCIPLES; HIGH NUMERICAL APERTURES; HIGH THROUGHPUT; ILLUMINATION SOURCES; INDEPENDENT CHANNELS; LARGE EXPOSURE FIELD; MASSIVE PARALLELISM;

MICROLENSES;

EID: 84893981448     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.275797     Document Type: Conference Paper

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