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Applied Physics A: Materials Science and Processing

Volumn 110, Issue 4, 2013, Pages 949-955

Influence of the ion energy on the structure of Bi and Fe2O 3 thin films

(4) Cardona, Dagoberto a,b Camps, Enrique a Escobar Alarcon L a Rodil, Sandra E b

a INSTITUTO NACIONAL DE INVESTIGACIONES NUCLEARES (Mexico)

b INSTITUTO DE INVESTIGACIONES EN MATERIALES (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH OXIDE THIN FILMS; BISMUTH THIN FILMS; HIGH-TECHNOLOGY APPLICATIONS; IRON OXIDE THIN FILMS; MAGNETIC AND ELECTRICAL PROPERTIES; METALLIC SYSTEMS; PREFERENTIAL ORIENTATION; REACTIVE ATMOSPHERES;

ABLATION; BISMUTH; BISMUTH COMPOUNDS; ELECTRIC PROPERTIES; IRON COMPOUNDS; IRON OXIDES; PLASMA DENSITY; PLASMAS; THIN FILMS;

DEPOSITION;

EID: 84893870969 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-012-7218-6 Document Type: Article

Times cited : (2)

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