In situ characterizations of nanostructured SnO x /Pt(111) surfaces using ambient-pressure XPS (APXPS) and high-pressure scanning tunneling microscopy (HPSTM)

Journal of Physical Chemistry C

Volumn 118, Issue 4, 2014, Pages 1935-1943

  Axnanda, Stephanus ^a   Zhu, Zhongwei ^a,b   Zhou, Weiping ^c   Mao, Baohua ^a   Chang, Rui ^a,d   Rani, Sana ^a   Crumlin, Ethan ^a   Somorjai, Gabor ^a,b   Liu, Zhi ^a,d  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c BROOKHAVEN NATIONAL LABORATORY   (United States)

^d SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT-PRESSURE X-RAY PHOTOELECTRON SPECTROSCOPIES; EXPOSURE CONDITIONS; HIGH-PRESSURE SCANNING TUNNELING MICROSCOPIES; IN-SITU CHARACTERIZATION; IN-SITU MEASUREMENT; LIQUID NITROGEN TEMPERATURE; NANO-STRUCTURED; ROOM TEMPERATURE;

CATALYSTS; NANOPARTICLES; PHOTOELECTRONS; PLATINUM; SCANNING TUNNELING MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

TIN;

EID: 84893228513     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp409272j     Document Type: Article

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