SCOPUS 정보 검색 플랫폼

Volumn 51, Issue , 2014, Pages 376-380

Energy dependence on formation of TiO2 nanofilms by Ti ion implantation and annealing

(9) Liu, Yichao a Ren, Feng a Cai, Guangxu a Zhou, Xiaodong a Hong, Mengqing a Li, Wenqing a Xiao, Xiangheng a Wu, Wei a Jiang, Changzhong a

a WUHAN UNIVERSITY (China)

Author keywords

A. Oxides; A. Thin films; B. Crystal growth; D. Diffusion

Indexed keywords

ACCELERATE VOLTAGE; ANATASE TIO; ANNEALING TEMPERATURES; ENERGY DEPENDENCE; ION ENERGIES; OXYGEN ATMOSPHERE; SUBSTRATE SURFACE; TI ION IMPLANTATION; NANO FILMS; TIO;

ANNEALING; ION IMPLANTATION; OXIDE MINERALS;

TITANIUM DIOXIDE;

EID: 84892777995 PISSN: 00255408 EISSN: None Source Type: Journal
DOI: 10.1016/j.materresbull.2013.12.040 Document Type: Article

Times cited : (6)

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