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Volumn 18, Issue 28, 2007, Pages
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Fabrication of single-crystal ZnO film by Zn ion implantation and subsequent annealing
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING TEMPERATURE;
CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY;
PL SPECTRA;
ZNO FILMS;
ANNEALING;
ION IMPLANTATION;
SILICA;
SINGLE CRYSTALS;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY PHOTOELECTRON SPECTROSCOPY;
ZINC OXIDE;
THIN FILMS;
NANOCRYSTAL;
NANOPARTICLE;
ZINC ION;
ZINC OXIDE;
ABSORPTION;
AIR;
ARTICLE;
CRYSTAL STRUCTURE;
FILM;
HIGH TEMPERATURE;
NANOFABRICATION;
OPTICS;
PRIORITY JOURNAL;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY PHOTOELECTRON SPECTROSCOPY;
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EID: 34447278624
PISSN: 09574484
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/18/28/285609 Document Type: Article |
Times cited : (18)
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References (21)
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