Physicochemical characterization and photoelectrochemical analysis of iron oxide films

Journal of Solid State Electrochemistry

Volumn 17, Issue 12, 2013, Pages 3005-3014

  Santamaria, M ^a   Terracina, S ^a   Konno, Y ^b   Habazaki, H ^b   Di Quarto, F ^a  

^a UNIVERSITY OF PALERMO   (Italy)

^b HOKKAIDO UNIVERSITY   (Japan)

Author keywords

Band gap; Flat band potential; Iron oxide; Nanostructures; Thin films

Indexed keywords

ANNEALING; ENERGY GAP; ETHYLENE; ETHYLENE GLYCOL; FLUORINE COMPOUNDS; HEMATITE; IRON ANALYSIS; IRON OXIDES; MAGNETITE; NANOSTRUCTURES; THIN FILMS;

ANNEALING TEMPERATURES; COMPOSITIONAL DEPTH PROFILE; ETHYLENE GLYCOL SOLUTIONS; FLAT BAND POTENTIAL; GROWTH CONDITIONS; NANOPOROUS STRUCTURES; PHOTOELECTROCHEMICAL ANALYSIS; PHYSICO-CHEMICAL CHARACTERIZATION;

OXIDE FILMS;

EID: 84892365084     PISSN: 14328488     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10008-013-2131-2     Document Type: Article

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