Atomic layer deposition of molybdenum oxide using bis(tert-butylimido) bis(dimethylamido) molybdenum

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 32, Issue 1, 2014, Pages

  Bertuch, Adam ^a   Sundaram, Ganesh ^a   Saly, Mark ^b   Moser, Daniel ^b   Kanjolia, Ravi ^b  

^a Ultratech Cambridge NanoTech   (United States)

^b SAFC Hitech   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER; DIMETHYLAMIDO; FILM PROPERTIES; MOLYBDENUM TRIOXIDE; NONUNIFORMITY; SECONDARY ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROSCOPY; TEMPERATURE RANGE;

ATOMIC LAYER DEPOSITION; MOLYBDENUM; MOLYBDENUM OXIDE; PHOTOELECTRONS; SECONDARY ION MASS SPECTROMETRY; THERMOGRAVIMETRIC ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION;

EID: 84891765133     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4843595     Document Type: Article

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