Conventional photolithography and process optimization of pattern- size expansion technique for nanogap biosensor fabrication

Advanced Materials Research

Volumn 832, Issue , 2014, Pages 89-94

  Sharma Rao, B ^a   Asri, M N ^a   Hashim, U ^a   Adam, Tijjani ^a  

^a UNIVERSITY MALAYSIA PERLIS   (Malaysia)

Author keywords

Biosensor; Clinical diagnostics; Critical dimension; Photolithography; Photoresist

Indexed keywords

BIOSENSOR FABRICATION; CLINICAL DIAGNOSTICS; CONVENTIONAL PHOTOLITHOGRAPHY; CRITICAL DIMENSION; DEVELOPER CONCENTRATION; MANUFACTURING PROCEDURE; PHOTOLITHOGRAPHY PROCESS; PRECISE ALIGNMENTS;

INDUSTRIAL RESEARCH; NANOSCIENCE; NANOSTRUCTURES; OPTIMIZATION; PHOTOLITHOGRAPHY; PHOTORESISTS;

BIOSENSORS;

EID: 84891622055     PISSN: 10226680     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/AMR.832.89     Document Type: Conference Paper

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