Influence of CNT incorporation on the photovoltaic behavior of TiO 2 films formed by high-voltage electrophoretic deposition

Current Applied Physics

Volumn 13, Issue 4 SUPPL.2, 2013, Pages

  Lee, E S ^a   Lee, K M ^a   Yoon, S I ^a   Ko, Y G ^b   Shin, D H ^a  

^a Hanyang University   (South Korea)

^b Yeungnam University   (South Korea)

Author keywords

CNT; Dye sensitized solar cell; Electrophoretic deposition; Titanium

Indexed keywords

CARBON NANOTUBES; DEPOSITION; ELECTROLYTES; ELECTROPHORESIS; OPEN CIRCUIT VOLTAGE; PHOTOVOLTAIC EFFECTS; SOLAR CELLS; SOLAR POWER GENERATION; TITANIUM; TITANIUM DIOXIDE; YARN;

ALKALINE ELECTROLYTES; ELECTROCHEMICAL IMPEDANCE ANALYSIS; ELECTROPHORETIC DEPOSITIONS; MICRO-STRUCTURAL OBSERVATIONS; PHOTOVOLTAIC RESPONSE; POWER CONVERSION EFFICIENCIES; TIO2 NANO-PARTICLES; TRANSPORT RESISTANCE;

DYE-SENSITIZED SOLAR CELLS;

EID: 84890559119     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2013.01.013     Document Type: Article

References (22)

1. B. O'Regan, M. Gräzel, Nature 353 (1991) 737-740.
2. A. Hagfeldt, G. Boschloo, L. Sun, L. Kloo, H. Pettersson, Chem. Rev. 110 (2010) 6595-6663.
3. A. Yella, H. Lee, H.N. Ysao, C. Yi, A.K. Chandiran, M.K. Nazeeruddin, E.W. Diau, C.Y. Yeh, S.M. Zakeeruddin, M. Gräzel, Science 334 (2011) 629-634.
4. Y. Noh, B. Yu, K. Yoo, M.J. Ko, O. Song, Korean J. Met. Mater. 50 (2012) 243-247.
5. G. Hashmi, K. Miettunen, T. Peltola, J. Halme, I. Asghar, K. Aitola, M. Toivola, P. Lund, Renew. Sustain. Energ. Rev. 15 (2011) 3717-3732.
6. H.W. Chen, K.C. Huang, C.Y. Hsu, C.Y. Lin, J.G. Chen, C.P. Lee, L.Y. Lin, R. Vittal, K.C. Ho, Electrochim. Acta 56 (2011) 7991-7998.
7. S. Ito, N.C. Ha, G. Rothenberger, P. Liska, P. Comte, S.M. Zakeeruddin, P. Péchy, M.K. Nazeeruddin, M. Gräzel, Chem. Commun. (2006) 4004-4006.
8. G.S. Kim, H.K. Seo, V.P. Godble, Y.S. Kim, O.B. Yang, H.S. Shin, Electrochem. Commun. 8 (2006) 961-966.
9. L. Zhao, J. Yu, J. Fan, P. Zhai, S. Wang, Electrochem. Commun. 11 (2009) 2052-2055.
10. W. Tan, X. Yin, X. Zhou, J. Zhang, X. Xiao, Y. Lin, Electrochim. Acta 54 (2009) 4467-4472.
11. M.P. Anatram, F. Léonard, Rep. Prog. Phys. 69 (2006) 507-561.
12. H.J. Choi, J.E. Shin, G.W. Lee, N.G. Park, K. Kim, S.C. Hong, Curr. Appl. Phys. 10 (2010) S165-S167.
13. A.K.K. Kyaw, H. Tantang, T. Wu, L. Ke, C. Peh, Z.H. Huang, X.T. Zeng, H.V. Demir, Q. Zhang, X.W. Sun, Appl. Phys. Lett. 99 (2011) 021107.
14. K.M. Lee, B.U. Lee, S.I. Yoon, E.S. Lee, B. Yoo, D.H. Shin, Electrochim. Acta 67 (2012) 6-11.
15. S. Ito, T.N. Murakami, P. Comte, P. Liska, C. Gräzel, M.K. Nazeeruddin, M. Gräzel, Thin Solid Films 516 (2008) 4613-4619.
16. H. Ago, K. Petritsch, M.S.P. Shaffer, A.H. Windle, R.H. Friend, Adv. Mater. 11 (1999) 1281-1285.
17. K.M. Lee, C.W. Hu, H.W. Chen, K.C. Ho, Sol. Energ. Mat. Sol. C. 92 (2008) 1628-1633.
18. M.S.P. Sarah, M.Z. Musa, M.N. Asiah, M. Rusop, Int. Conf. Electron. Des. Syst. Appl. (2010) 361-364.
19. F. Fabregat-Santiago, G. Garcia-Belmonte, I. Mora-Seró, J. Bisquert, Phys. Chem. Chem. Phys. 13 (2011) 9083-9118.
20. I. Shin, H. Seo, M.K. Son, J.K. Kim, K. Prabakar, H.J. Kim, Curr. Appl. Phys. 10 (2010) S422-S424.
21. Y. Noh, K. Yoo, B. Yu, J. Han, M. Ko, O. Song, Korean J. Met. Mater. 50 (2012) 159-163.
22. Q. Wang, J.E. Moser, M. Gräzel, J. Phys. Chem. B 190 (2005) 14945-14953.