A photoactive Porphyrin-based periodic mesoporous organosilica thin film

Journal of the American Chemical Society

Volumn 135, Issue 49, 2013, Pages 18513-18519

  Li, Yan ^a   Auras, Florian ^a   Löbermann, Florian ^a   Döblinger, Markus ^a   Schuster, Jörg ^a   Peter, Laurence ^b   Trauner, Dirk ^a   Bein, Thomas ^a  

^a UNIVERSITY OF MUNICH   (Germany)

^b University of Bath Claverton Down   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

BUTYRIC ACID; PORE SIZE; PORPHYRINS; SELF ASSEMBLY; SILICA;

CONDUCTING PROPERTIES; ELECTRON CONDUCTING; EVAPORATION INDUCED SELF ASSEMBLIES; INTERPENETRATING DONOR; OPTOELECTRONIC MEASUREMENTS; PERIODIC MESOPOROUS ORGANOSILICA THIN FILMS; PERIODIC MESOPOROUS ORGANOSILICAS; POROUS STRUCTURES;

THIN FILMS;

BUTYRIC ACID; ESTER; MACROCYCLIC COMPOUND; PERIODIC MESOPOROUS ORGANOSILICA; PORPHYRIN; SILICON DIOXIDE; UNCLASSIFIED DRUG;

ADSORPTION; ARTICLE; CARBON NUCLEAR MAGNETIC RESONANCE; CHEMICAL ENVIRONMENT; CHEMICAL STRUCTURE; CHROMATOPHORE; CONDUCTANCE; ELECTRON; ENERGY TRANSFER; FILM; FOURIER TRANSFORMATION; LIGHT ABSORPTION; MEASUREMENT; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; OXIDATION REDUCTION POTENTIAL; PARTICLE SIZE; POROSITY; PRECURSOR; SOLVENT EXTRACTION; SYNTHESIS; THICKNESS; X RAY CRYSTALLOGRAPHY;

EID: 84890525006     PISSN: 00027863     EISSN: 15205126     Source Type: Journal    
DOI: 10.1021/ja4082028     Document Type: Article

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