A highly reactive photobase catalytic system for sol-gel polymerization

Thin Solid Films

Volumn 550, Issue , 2014, Pages 177-183

  Chemtob, Abraham ^a   De Paz Simon, Héloïse ^a   Dietlin, Céline ^a   Croutxé Barghorn, Céline ^a   Salmi, Hanène ^a   Allonas, Xavier ^a   Chany, Anne Caroline ^a   Vidal, Loïc ^b   Rigolet, Séverinne ^b  

^a Ecole Nationale Superieure de Chimie de Mulhouse   (France)

^b UNIVERSITÉ DE HAUTE ALSACE   (France)

Author keywords

Alkoxysilane; Photoacid; Photobase; Sol gel; Tertiary amine catalyst; UV irradiation

Indexed keywords

ALKOXYSILANES; PHOTOACIDS; PHOTOBASE; TERTIARY AMINE; UV IRRADIATION;

CATALYSIS; CATALYSTS; PHOTOPOLYMERIZATION; PHOTOSENSITIZERS; POLYMERIZATION; REACTION KINETICS; SCAVENGING; SILICATES; SOL-GEL PROCESS;

SOL-GELS;

EID: 84890316869     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.10.146     Document Type: Article

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